Lipseals and contact elements for semiconductor electroplating apparatuses

Disclosed are cup assemblies for holding, sealing, and providing electrical power to a semiconductor substrate during electroplating which may include a cup bottom element having a main body portion and a moment arm, an elastomeric sealing element disposed on the moment arm, and an electrical contac...

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Hauptverfasser: Stowell, Robert Marshall, Ramesh, Ashwin, Ghongadi, Shantinath, Feng, Jingbin
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creator Stowell, Robert Marshall
Ramesh, Ashwin
Ghongadi, Shantinath
Feng, Jingbin
description Disclosed are cup assemblies for holding, sealing, and providing electrical power to a semiconductor substrate during electroplating which may include a cup bottom element having a main body portion and a moment arm, an elastomeric sealing element disposed on the moment arm, and an electrical contact element disposed on the elastomeric sealing element. The main body portion may be such that it does not substantially flex when a substrate is pressed against the moment arm, and it may be rigidly affixed to another feature of the cup structure. The ratio of the average vertical thickness of the main body portion to that of the moment arm may be greater than about 5. The electrical contact element may have a substantially flat but flexible contact portion disposed upon a substantially horizontal portion of the sealing element. The elastomeric sealing element may be integrated with the cup bottom element during manufacturing.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US11512408B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US11512408B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US11512408B23</originalsourceid><addsrcrecordid>eNqNjDEKAjEQRdNYiHqH8QCCuypYK4qInVovQ_avBLLJkJm9vyk8gNXj8z5v7u6PIAqOSpx68jkZeyNEjEimNORCijFU0U_e6qrKW8kS2UL6EItwYZsUunSzoYaw-nHh1tfL63zbQHIHFfZIsO79bJpD0-63x1O7--fzBZIjNjY</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Lipseals and contact elements for semiconductor electroplating apparatuses</title><source>esp@cenet</source><creator>Stowell, Robert Marshall ; Ramesh, Ashwin ; Ghongadi, Shantinath ; Feng, Jingbin</creator><creatorcontrib>Stowell, Robert Marshall ; Ramesh, Ashwin ; Ghongadi, Shantinath ; Feng, Jingbin</creatorcontrib><description>Disclosed are cup assemblies for holding, sealing, and providing electrical power to a semiconductor substrate during electroplating which may include a cup bottom element having a main body portion and a moment arm, an elastomeric sealing element disposed on the moment arm, and an electrical contact element disposed on the elastomeric sealing element. The main body portion may be such that it does not substantially flex when a substrate is pressed against the moment arm, and it may be rigidly affixed to another feature of the cup structure. The ratio of the average vertical thickness of the main body portion to that of the moment arm may be greater than about 5. The electrical contact element may have a substantially flat but flexible contact portion disposed upon a substantially horizontal portion of the sealing element. The elastomeric sealing element may be integrated with the cup bottom element during manufacturing.</description><language>eng</language><subject>APPARATUS THEREFOR ; CHEMISTRY ; ELECTROFORMING ; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES ; METALLURGY ; PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20221129&amp;DB=EPODOC&amp;CC=US&amp;NR=11512408B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20221129&amp;DB=EPODOC&amp;CC=US&amp;NR=11512408B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Stowell, Robert Marshall</creatorcontrib><creatorcontrib>Ramesh, Ashwin</creatorcontrib><creatorcontrib>Ghongadi, Shantinath</creatorcontrib><creatorcontrib>Feng, Jingbin</creatorcontrib><title>Lipseals and contact elements for semiconductor electroplating apparatuses</title><description>Disclosed are cup assemblies for holding, sealing, and providing electrical power to a semiconductor substrate during electroplating which may include a cup bottom element having a main body portion and a moment arm, an elastomeric sealing element disposed on the moment arm, and an electrical contact element disposed on the elastomeric sealing element. The main body portion may be such that it does not substantially flex when a substrate is pressed against the moment arm, and it may be rigidly affixed to another feature of the cup structure. The ratio of the average vertical thickness of the main body portion to that of the moment arm may be greater than about 5. The electrical contact element may have a substantially flat but flexible contact portion disposed upon a substantially horizontal portion of the sealing element. The elastomeric sealing element may be integrated with the cup bottom element during manufacturing.</description><subject>APPARATUS THEREFOR</subject><subject>CHEMISTRY</subject><subject>ELECTROFORMING</subject><subject>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</subject><subject>METALLURGY</subject><subject>PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjDEKAjEQRdNYiHqH8QCCuypYK4qInVovQ_avBLLJkJm9vyk8gNXj8z5v7u6PIAqOSpx68jkZeyNEjEimNORCijFU0U_e6qrKW8kS2UL6EItwYZsUunSzoYaw-nHh1tfL63zbQHIHFfZIsO79bJpD0-63x1O7--fzBZIjNjY</recordid><startdate>20221129</startdate><enddate>20221129</enddate><creator>Stowell, Robert Marshall</creator><creator>Ramesh, Ashwin</creator><creator>Ghongadi, Shantinath</creator><creator>Feng, Jingbin</creator><scope>EVB</scope></search><sort><creationdate>20221129</creationdate><title>Lipseals and contact elements for semiconductor electroplating apparatuses</title><author>Stowell, Robert Marshall ; Ramesh, Ashwin ; Ghongadi, Shantinath ; Feng, Jingbin</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US11512408B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2022</creationdate><topic>APPARATUS THEREFOR</topic><topic>CHEMISTRY</topic><topic>ELECTROFORMING</topic><topic>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</topic><topic>METALLURGY</topic><topic>PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</topic><toplevel>online_resources</toplevel><creatorcontrib>Stowell, Robert Marshall</creatorcontrib><creatorcontrib>Ramesh, Ashwin</creatorcontrib><creatorcontrib>Ghongadi, Shantinath</creatorcontrib><creatorcontrib>Feng, Jingbin</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Stowell, Robert Marshall</au><au>Ramesh, Ashwin</au><au>Ghongadi, Shantinath</au><au>Feng, Jingbin</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Lipseals and contact elements for semiconductor electroplating apparatuses</title><date>2022-11-29</date><risdate>2022</risdate><abstract>Disclosed are cup assemblies for holding, sealing, and providing electrical power to a semiconductor substrate during electroplating which may include a cup bottom element having a main body portion and a moment arm, an elastomeric sealing element disposed on the moment arm, and an electrical contact element disposed on the elastomeric sealing element. The main body portion may be such that it does not substantially flex when a substrate is pressed against the moment arm, and it may be rigidly affixed to another feature of the cup structure. The ratio of the average vertical thickness of the main body portion to that of the moment arm may be greater than about 5. The electrical contact element may have a substantially flat but flexible contact portion disposed upon a substantially horizontal portion of the sealing element. The elastomeric sealing element may be integrated with the cup bottom element during manufacturing.</abstract><oa>free_for_read</oa></addata></record>
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source esp@cenet
subjects APPARATUS THEREFOR
CHEMISTRY
ELECTROFORMING
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES
METALLURGY
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS
title Lipseals and contact elements for semiconductor electroplating apparatuses
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-29T08%3A36%3A37IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Stowell,%20Robert%20Marshall&rft.date=2022-11-29&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS11512408B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true