Method and device for the determination of film forming amines in a liquid
A photometric method for determination of a concentration of a film forming amine in a liquid, including providing a buffer solution of a weak acid having a pKa≥4.5 and a strong acid having a pKa≤1; diluting an aliquot of the buffer solution with water, and determining the pH of the diluted buffer s...
Gespeichert in:
Hauptverfasser: | , , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | Ramminger, Ute Nickel, Ulrich Fandrich, Jörg |
description | A photometric method for determination of a concentration of a film forming amine in a liquid, including providing a buffer solution of a weak acid having a pKa≥4.5 and a strong acid having a pKa≤1; diluting an aliquot of the buffer solution with water, and determining the pH of the diluted buffer solution; adding reagent to the diluted buffer solution and measuring an initial absorbance of the diluted buffer/reagent solution; preparing a sample solution by adding liquid containing the film forming amine to an aliquot of the buffer solution and measuring the pH of the sample solution; adjusting the pH of the sample solution to match the pH of the diluted buffer solution by adding strong acid; and adding the reagent to the pH adjusted sample solution to form a colored complex, and measuring the absorbance of the resulting solution in a photometer. |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US11474045B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US11474045B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US11474045B23</originalsourceid><addsrcrecordid>eNrjZPDyTS3JyE9RSMxLUUhJLctMTlVIyy9SKMlIBXJLUotyM_MSSzLz8xTy0xTSMnNyQbJAsXSFRCCZWqyQmaeQqJCTWViamcLDwJqWmFOcyguluRkU3VxDnD10Uwvy41OLCxKTU_NSS-JDgw0NTcxNDExMnYyMiVEDAM4uNIQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Method and device for the determination of film forming amines in a liquid</title><source>esp@cenet</source><creator>Ramminger, Ute ; Nickel, Ulrich ; Fandrich, Jörg</creator><creatorcontrib>Ramminger, Ute ; Nickel, Ulrich ; Fandrich, Jörg</creatorcontrib><description>A photometric method for determination of a concentration of a film forming amine in a liquid, including providing a buffer solution of a weak acid having a pKa≥4.5 and a strong acid having a pKa≤1; diluting an aliquot of the buffer solution with water, and determining the pH of the diluted buffer solution; adding reagent to the diluted buffer solution and measuring an initial absorbance of the diluted buffer/reagent solution; preparing a sample solution by adding liquid containing the film forming amine to an aliquot of the buffer solution and measuring the pH of the sample solution; adjusting the pH of the sample solution to match the pH of the diluted buffer solution by adding strong acid; and adding the reagent to the pH adjusted sample solution to form a colored complex, and measuring the absorbance of the resulting solution in a photometer.</description><language>eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES ; MEASURING ; METALLURGY ; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 ; NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE ; PHYSICS ; TESTING</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221018&DB=EPODOC&CC=US&NR=11474045B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25562,76317</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221018&DB=EPODOC&CC=US&NR=11474045B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Ramminger, Ute</creatorcontrib><creatorcontrib>Nickel, Ulrich</creatorcontrib><creatorcontrib>Fandrich, Jörg</creatorcontrib><title>Method and device for the determination of film forming amines in a liquid</title><description>A photometric method for determination of a concentration of a film forming amine in a liquid, including providing a buffer solution of a weak acid having a pKa≥4.5 and a strong acid having a pKa≤1; diluting an aliquot of the buffer solution with water, and determining the pH of the diluted buffer solution; adding reagent to the diluted buffer solution and measuring an initial absorbance of the diluted buffer/reagent solution; preparing a sample solution by adding liquid containing the film forming amine to an aliquot of the buffer solution and measuring the pH of the sample solution; adjusting the pH of the sample solution to match the pH of the diluted buffer solution by adding strong acid; and adding the reagent to the pH adjusted sample solution to form a colored complex, and measuring the absorbance of the resulting solution in a photometer.</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</subject><subject>MEASURING</subject><subject>METALLURGY</subject><subject>MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25</subject><subject>NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE</subject><subject>PHYSICS</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZPDyTS3JyE9RSMxLUUhJLctMTlVIyy9SKMlIBXJLUotyM_MSSzLz8xTy0xTSMnNyQbJAsXSFRCCZWqyQmaeQqJCTWViamcLDwJqWmFOcyguluRkU3VxDnD10Uwvy41OLCxKTU_NSS-JDgw0NTcxNDExMnYyMiVEDAM4uNIQ</recordid><startdate>20221018</startdate><enddate>20221018</enddate><creator>Ramminger, Ute</creator><creator>Nickel, Ulrich</creator><creator>Fandrich, Jörg</creator><scope>EVB</scope></search><sort><creationdate>20221018</creationdate><title>Method and device for the determination of film forming amines in a liquid</title><author>Ramminger, Ute ; Nickel, Ulrich ; Fandrich, Jörg</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US11474045B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2022</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</topic><topic>MEASURING</topic><topic>METALLURGY</topic><topic>MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25</topic><topic>NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE</topic><topic>PHYSICS</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>Ramminger, Ute</creatorcontrib><creatorcontrib>Nickel, Ulrich</creatorcontrib><creatorcontrib>Fandrich, Jörg</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Ramminger, Ute</au><au>Nickel, Ulrich</au><au>Fandrich, Jörg</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Method and device for the determination of film forming amines in a liquid</title><date>2022-10-18</date><risdate>2022</risdate><abstract>A photometric method for determination of a concentration of a film forming amine in a liquid, including providing a buffer solution of a weak acid having a pKa≥4.5 and a strong acid having a pKa≤1; diluting an aliquot of the buffer solution with water, and determining the pH of the diluted buffer solution; adding reagent to the diluted buffer solution and measuring an initial absorbance of the diluted buffer/reagent solution; preparing a sample solution by adding liquid containing the film forming amine to an aliquot of the buffer solution and measuring the pH of the sample solution; adjusting the pH of the sample solution to match the pH of the diluted buffer solution by adding strong acid; and adding the reagent to the pH adjusted sample solution to form a colored complex, and measuring the absorbance of the resulting solution in a photometer.</abstract><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | eng |
recordid | cdi_epo_espacenet_US11474045B2 |
source | esp@cenet |
subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING METALLURGY MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE PHYSICS TESTING |
title | Method and device for the determination of film forming amines in a liquid |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-10T05%3A31%3A52IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Ramminger,%20Ute&rft.date=2022-10-18&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS11474045B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |