Methods and apparatus for in-situ protection liners for high aspect ratio reactive ion etching

Methods and apparatus for producing high aspect ratio features in a substrate using reactive ion etching. In some embodiments, a method comprises flowing acetylene gas into a process chamber to produce a diamond like carbon deposition on a pattern mask or on at least one layer of oxide or nitride on...

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Bibliographische Detailangaben

Hauptverfasser:	Payyapilly, Jairaj Joseph, Hatakeyama, Taiki, Koseki, Shinichi, Watanabe, Hikaru, Kang, Sean S, Shimizu, Daisuke
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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