Device manufacturing method and computer program

A device manufacturing method using a lithographic apparatus having a localized immersion system for confining an immersion liquid to a space between a projection system and a substrate to be exposed by the projection system, the method including: predicting a set of first locations on the substrate...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Hoefnagels, Pieter Jeroen Johan Emanuel, Kox, Ronald Frank, Van Oene, Maarten Marinus, Vieyra Salas, Jorge Alberto, Gattobigio, Giovanni Luca, Van Der Zanden, Marcus Johannes
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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