Method of direct etching fabrication of waveguide combiners
Embodiments described herein relate to methods for fabricating waveguide structures utilizing substrates. The waveguide structures are formed having input coupling regions, waveguide regions, and output coupling regions formed from substrates. The regions are formed by imprinting stamps into resists...
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| creator | Meyer Timmerman Thijssen, Rutger McMillan, Wayne Visser, Robert Jan Young, Michael Yu-tak |
| description | Embodiments described herein relate to methods for fabricating waveguide structures utilizing substrates. The waveguide structures are formed having input coupling regions, waveguide regions, and output coupling regions formed from substrates. The regions are formed by imprinting stamps into resists disposed on hard masks formed on surfaces of the substrates to form positive waveguide patterns. Portions of the positive waveguide patterns and the hard masks formed under the portions are removed. The substrates are masked and etched to form gratings in the input coupling regions and the output coupling regions. Residual portions of the positive waveguide patterns and the hard masks disposed under the residual portions are removed to form waveguide structures having input coupling regions, waveguide regions, and output coupling regions formed from substrates. |
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The waveguide structures are formed having input coupling regions, waveguide regions, and output coupling regions formed from substrates. The regions are formed by imprinting stamps into resists disposed on hard masks formed on surfaces of the substrates to form positive waveguide patterns. Portions of the positive waveguide patterns and the hard masks formed under the portions are removed. The substrates are masked and etched to form gratings in the input coupling regions and the output coupling regions. Residual portions of the positive waveguide patterns and the hard masks disposed under the residual portions are removed to form waveguide structures having input coupling regions, waveguide regions, and output coupling regions formed from substrates.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BLASTING ; CINEMATOGRAPHY ; DECORATIVE ARTS ; ELECTROGRAPHY ; FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMSTHEREOF ; HEATING ; HOLOGRAPHY ; LIGHTING ; MATERIALS THEREFOR ; MECHANICAL ENGINEERING ; MOSAICS ; ORIGINALS THEREFOR ; PAPERHANGING ; PERFORMING OPERATIONS ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; PRODUCING DECORATIVE EFFECTS ; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHERARTICLES, NOT OTHERWISE PROVIDED FOR ; TARSIA WORK ; TRANSPORTING ; WEAPONS</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220510&DB=EPODOC&CC=US&NR=11327218B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220510&DB=EPODOC&CC=US&NR=11327218B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Meyer Timmerman Thijssen, Rutger</creatorcontrib><creatorcontrib>McMillan, Wayne</creatorcontrib><creatorcontrib>Visser, Robert Jan</creatorcontrib><creatorcontrib>Young, Michael Yu-tak</creatorcontrib><title>Method of direct etching fabrication of waveguide combiners</title><description>Embodiments described herein relate to methods for fabricating waveguide structures utilizing substrates. The waveguide structures are formed having input coupling regions, waveguide regions, and output coupling regions formed from substrates. The regions are formed by imprinting stamps into resists disposed on hard masks formed on surfaces of the substrates to form positive waveguide patterns. Portions of the positive waveguide patterns and the hard masks formed under the portions are removed. The substrates are masked and etched to form gratings in the input coupling regions and the output coupling regions. Residual portions of the positive waveguide patterns and the hard masks disposed under the residual portions are removed to form waveguide structures having input coupling regions, waveguide regions, and output coupling regions formed from substrates.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BLASTING</subject><subject>CINEMATOGRAPHY</subject><subject>DECORATIVE ARTS</subject><subject>ELECTROGRAPHY</subject><subject>FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMSTHEREOF</subject><subject>HEATING</subject><subject>HOLOGRAPHY</subject><subject>LIGHTING</subject><subject>MATERIALS THEREFOR</subject><subject>MECHANICAL ENGINEERING</subject><subject>MOSAICS</subject><subject>ORIGINALS THEREFOR</subject><subject>PAPERHANGING</subject><subject>PERFORMING OPERATIONS</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>PRODUCING DECORATIVE EFFECTS</subject><subject>STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHERARTICLES, NOT OTHERWISE PROVIDED FOR</subject><subject>TARSIA WORK</subject><subject>TRANSPORTING</subject><subject>WEAPONS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLD2TS3JyE9RyE9TSMksSk0uUUgtSc7IzEtXSEtMKspMTizJzM8DyZYnlqWml2ampCok5-cmZealFhXzMLCmJeYUp_JCaW4GRTfXEGcP3dSC_PjU4oLE5NS81JL40GBDQ2MjcyNDCycjY2LUAACsIy-V</recordid><startdate>20220510</startdate><enddate>20220510</enddate><creator>Meyer Timmerman Thijssen, Rutger</creator><creator>McMillan, Wayne</creator><creator>Visser, Robert Jan</creator><creator>Young, Michael Yu-tak</creator><scope>EVB</scope></search><sort><creationdate>20220510</creationdate><title>Method of direct etching fabrication of waveguide combiners</title><author>Meyer Timmerman Thijssen, Rutger ; McMillan, Wayne ; Visser, Robert Jan ; Young, Michael Yu-tak</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US11327218B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2022</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BLASTING</topic><topic>CINEMATOGRAPHY</topic><topic>DECORATIVE ARTS</topic><topic>ELECTROGRAPHY</topic><topic>FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMSTHEREOF</topic><topic>HEATING</topic><topic>HOLOGRAPHY</topic><topic>LIGHTING</topic><topic>MATERIALS THEREFOR</topic><topic>MECHANICAL ENGINEERING</topic><topic>MOSAICS</topic><topic>ORIGINALS THEREFOR</topic><topic>PAPERHANGING</topic><topic>PERFORMING OPERATIONS</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>PRODUCING DECORATIVE EFFECTS</topic><topic>STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHERARTICLES, NOT OTHERWISE PROVIDED FOR</topic><topic>TARSIA WORK</topic><topic>TRANSPORTING</topic><topic>WEAPONS</topic><toplevel>online_resources</toplevel><creatorcontrib>Meyer Timmerman Thijssen, Rutger</creatorcontrib><creatorcontrib>McMillan, Wayne</creatorcontrib><creatorcontrib>Visser, Robert Jan</creatorcontrib><creatorcontrib>Young, Michael Yu-tak</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Meyer Timmerman Thijssen, Rutger</au><au>McMillan, Wayne</au><au>Visser, Robert Jan</au><au>Young, Michael Yu-tak</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Method of direct etching fabrication of waveguide combiners</title><date>2022-05-10</date><risdate>2022</risdate><abstract>Embodiments described herein relate to methods for fabricating waveguide structures utilizing substrates. The waveguide structures are formed having input coupling regions, waveguide regions, and output coupling regions formed from substrates. The regions are formed by imprinting stamps into resists disposed on hard masks formed on surfaces of the substrates to form positive waveguide patterns. Portions of the positive waveguide patterns and the hard masks formed under the portions are removed. The substrates are masked and etched to form gratings in the input coupling regions and the output coupling regions. Residual portions of the positive waveguide patterns and the hard masks disposed under the residual portions are removed to form waveguide structures having input coupling regions, waveguide regions, and output coupling regions formed from substrates.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BLASTING CINEMATOGRAPHY DECORATIVE ARTS ELECTROGRAPHY FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMSTHEREOF HEATING HOLOGRAPHY LIGHTING MATERIALS THEREFOR MECHANICAL ENGINEERING MOSAICS ORIGINALS THEREFOR PAPERHANGING PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PRODUCING DECORATIVE EFFECTS STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHERARTICLES, NOT OTHERWISE PROVIDED FOR TARSIA WORK TRANSPORTING WEAPONS |
| title | Method of direct etching fabrication of waveguide combiners |
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