Multiple spacer patterning schemes

The present disclosure provides forming nanostructures utilizing multiple patterning process with good profile control and feature transfer integrity. In one embodiment, a method for forming features on a substrate includes forming a mandrel layer on a substrate, conformally forming a spacer layer o...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Li, Chao, Lee, Gene, Oshio, Hidetaka, Huang, Zubin, Guggilla, Srinivas, Gupta, Meenakshi, Yang, Tzu-shun, Janakiraman, Karthik, Lin, Yung-chen, Kedlaya, Diwakar, Cheng, Rui
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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