Semiconductor device containing tubular liner spacer for lateral confinement of self-aligned silicide portions and methods of forming the same

A semiconductor structure includes a semiconductor channel of a first conductivity type located between a first and second active regions having a doping of a second conductivity type that is opposite of the first conductivity type, a gate stack structure that overlies the semiconductor channel, and...

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Bibliographische Detailangaben
Hauptverfasser: Kita, Yosuke, Amano, Fumitaka
Format: Patent
Sprache:eng
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