Semiconductor device and method of forming SIP module over film layer

A semiconductor device has a semiconductor die or component, including an IPD, disposed over an attach area of a penetrable film layer with a portion of the semiconductor die or component embedded in the penetrable film layer. A conductive layer is formed over a portion of the film layer within the...

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Hauptverfasser: Yoon, InSang, Kim, OhHan, Beak, WoonJae, Lee, HunTeak, Kim, KyungHwan
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creator Yoon, InSang
Kim, OhHan
Beak, WoonJae
Lee, HunTeak
Kim, KyungHwan
description A semiconductor device has a semiconductor die or component, including an IPD, disposed over an attach area of a penetrable film layer with a portion of the semiconductor die or component embedded in the penetrable film layer. A conductive layer is formed over a portion of the film layer within the attach area and over a portion of the film layer outside the attach area. An encapsulant is deposited over the film layer, conductive layer, and semiconductor die or component. The conductive layer extends outside the encapsulant. An insulating material can be disposed under the semiconductor die or component. A shielding layer is formed over the encapsulant. The shielding layer is electrically connected to the conductive layer. The penetrable film layer is removed. The semiconductor die or component disposed over the film layer and covered by the encapsulant and shielding layer form an SIP module without a substrate.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US11309193B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US11309193B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US11309193B23</originalsourceid><addsrcrecordid>eNqNyjEKwjAUBuAsDlK9w_MABWOmrkpFNyE6l5D8sYEkr6Rpwdu7eACnb_m2otdIwXJ2i61cyGENFmSyo4Q6siP25LmkkN-k7w9K7JYI4hWFfIiJovmg7MTGmzhj_7MRh2v_vNxaTDxgnoxFRh1eWkp17GSnzif1z_kCwmwy0w</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Semiconductor device and method of forming SIP module over film layer</title><source>esp@cenet</source><creator>Yoon, InSang ; Kim, OhHan ; Beak, WoonJae ; Lee, HunTeak ; Kim, KyungHwan</creator><creatorcontrib>Yoon, InSang ; Kim, OhHan ; Beak, WoonJae ; Lee, HunTeak ; Kim, KyungHwan</creatorcontrib><description>A semiconductor device has a semiconductor die or component, including an IPD, disposed over an attach area of a penetrable film layer with a portion of the semiconductor die or component embedded in the penetrable film layer. A conductive layer is formed over a portion of the film layer within the attach area and over a portion of the film layer outside the attach area. An encapsulant is deposited over the film layer, conductive layer, and semiconductor die or component. The conductive layer extends outside the encapsulant. An insulating material can be disposed under the semiconductor die or component. A shielding layer is formed over the encapsulant. The shielding layer is electrically connected to the conductive layer. The penetrable film layer is removed. The semiconductor die or component disposed over the film layer and covered by the encapsulant and shielding layer form an SIP module without a substrate.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20220419&amp;DB=EPODOC&amp;CC=US&amp;NR=11309193B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25562,76317</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20220419&amp;DB=EPODOC&amp;CC=US&amp;NR=11309193B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Yoon, InSang</creatorcontrib><creatorcontrib>Kim, OhHan</creatorcontrib><creatorcontrib>Beak, WoonJae</creatorcontrib><creatorcontrib>Lee, HunTeak</creatorcontrib><creatorcontrib>Kim, KyungHwan</creatorcontrib><title>Semiconductor device and method of forming SIP module over film layer</title><description>A semiconductor device has a semiconductor die or component, including an IPD, disposed over an attach area of a penetrable film layer with a portion of the semiconductor die or component embedded in the penetrable film layer. A conductive layer is formed over a portion of the film layer within the attach area and over a portion of the film layer outside the attach area. An encapsulant is deposited over the film layer, conductive layer, and semiconductor die or component. The conductive layer extends outside the encapsulant. An insulating material can be disposed under the semiconductor die or component. A shielding layer is formed over the encapsulant. The shielding layer is electrically connected to the conductive layer. The penetrable film layer is removed. The semiconductor die or component disposed over the film layer and covered by the encapsulant and shielding layer form an SIP module without a substrate.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyjEKwjAUBuAsDlK9w_MABWOmrkpFNyE6l5D8sYEkr6Rpwdu7eACnb_m2otdIwXJ2i61cyGENFmSyo4Q6siP25LmkkN-k7w9K7JYI4hWFfIiJovmg7MTGmzhj_7MRh2v_vNxaTDxgnoxFRh1eWkp17GSnzif1z_kCwmwy0w</recordid><startdate>20220419</startdate><enddate>20220419</enddate><creator>Yoon, InSang</creator><creator>Kim, OhHan</creator><creator>Beak, WoonJae</creator><creator>Lee, HunTeak</creator><creator>Kim, KyungHwan</creator><scope>EVB</scope></search><sort><creationdate>20220419</creationdate><title>Semiconductor device and method of forming SIP module over film layer</title><author>Yoon, InSang ; Kim, OhHan ; Beak, WoonJae ; Lee, HunTeak ; Kim, KyungHwan</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US11309193B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2022</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>Yoon, InSang</creatorcontrib><creatorcontrib>Kim, OhHan</creatorcontrib><creatorcontrib>Beak, WoonJae</creatorcontrib><creatorcontrib>Lee, HunTeak</creatorcontrib><creatorcontrib>Kim, KyungHwan</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Yoon, InSang</au><au>Kim, OhHan</au><au>Beak, WoonJae</au><au>Lee, HunTeak</au><au>Kim, KyungHwan</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Semiconductor device and method of forming SIP module over film layer</title><date>2022-04-19</date><risdate>2022</risdate><abstract>A semiconductor device has a semiconductor die or component, including an IPD, disposed over an attach area of a penetrable film layer with a portion of the semiconductor die or component embedded in the penetrable film layer. A conductive layer is formed over a portion of the film layer within the attach area and over a portion of the film layer outside the attach area. An encapsulant is deposited over the film layer, conductive layer, and semiconductor die or component. The conductive layer extends outside the encapsulant. An insulating material can be disposed under the semiconductor die or component. A shielding layer is formed over the encapsulant. The shielding layer is electrically connected to the conductive layer. The penetrable film layer is removed. The semiconductor die or component disposed over the film layer and covered by the encapsulant and shielding layer form an SIP module without a substrate.</abstract><oa>free_for_read</oa></addata></record>
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title Semiconductor device and method of forming SIP module over film layer
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-09T20%3A20%3A11IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Yoon,%20InSang&rft.date=2022-04-19&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS11309193B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true