Lithographic apparatus and method
A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
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| creator | Laurent, Thibault Simon Mathieu Kunnen, Johan Gertrudis Cornelis Ottens, Joost Jeroen Jacobs, Johannes Henricus Wilhelmus Knarren, Bastiaan Andreas Wilhelmus Hubertus Remie, Marinus Jan Voogd, Robbert Jan Nino, Giovanni Francisco Ten Kate, Nicolaas |
| description | A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area. |
| format | Patent |
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| language | eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Lithographic apparatus and method |
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