Resistive change elements using passivating interface gaps and methods for making same

Resistive change elements using passivating interface gaps and methods for making same

A method to fabricate a resistive change element. The method may include forming a stack over a substrate. The stack may include a conductive material, a resistive change material, a first surface, and a second surfaces opposite the first surface. The method may further include depositing a first ma...

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Hauptverfasser: Nozawa, Syuji, Rueckes, Thomas, Sato, Nagisa, Ramsbey, Mark, Yamaguchi, Tatsuya
Format: Patent
Sprache:eng
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BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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creator Nozawa, Syuji
Rueckes, Thomas
Sato, Nagisa
Ramsbey, Mark
Yamaguchi, Tatsuya
description A method to fabricate a resistive change element. The method may include forming a stack over a substrate. The stack may include a conductive material, a resistive change material, a first surface, and a second surfaces opposite the first surface. The method may further include depositing a first material over the stack such that the first material directly contacts at least one of the first surface and the second surface of the stack. The method may also include after depositing the first material, forming a second material over the first material and evaporating a portion of the first material through the second material to create a gap between the second material and the at least one of the first surface and the second surface of the stack.
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title Resistive change elements using passivating interface gaps and methods for making same
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