Film forming device and method for forming metal film using the same
A film forming device that avoids a leakage of a liquid electrolyte and a method for forming a metal film using the film forming device are provided. The film forming device to form the metal film includes an anode, a cathode, a solid electrolyte membrane disposed between the anode and the cathode,...
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| creator | Satou, Yuuki Okamoto, Kazuaki |
| description | A film forming device that avoids a leakage of a liquid electrolyte and a method for forming a metal film using the film forming device are provided. The film forming device to form the metal film includes an anode, a cathode, a solid electrolyte membrane disposed between the anode and the cathode, a solution container that defines a solution containing space between the anode and the solid electrolyte membrane, and a power supply that applies a voltage between the anode and the cathode. The solid electrolyte membrane includes a first surface exposed to the solution containing space and a second surface opposed to the cathode, and is dividable along a division surface having no common point with the first surface or the second surface. |
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The solid electrolyte membrane includes a first surface exposed to the solution containing space and a second surface opposed to the cathode, and is dividable along a division surface having no common point with the first surface or the second surface.</description><language>eng</language><subject>APPARATUS THEREFOR ; CHEMISTRY ; ELECTROFORMING ; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES ; METALLURGY ; PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220118&DB=EPODOC&CC=US&NR=11225728B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220118&DB=EPODOC&CC=US&NR=11225728B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Satou, Yuuki</creatorcontrib><creatorcontrib>Okamoto, Kazuaki</creatorcontrib><title>Film forming device and method for forming metal film using the same</title><description>A film forming device that avoids a leakage of a liquid electrolyte and a method for forming a metal film using the film forming device are provided. 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| subjects | APPARATUS THEREFOR CHEMISTRY ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES METALLURGY PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS |
| title | Film forming device and method for forming metal film using the same |
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