Vacuum treatment chamber and method of manufacturing a vacuum treated plate-shaped substrate
A vacuum treatment chamber includes a vacuum recipient and therein a screen. Within the screen there is provided a stationary substrate support. Within the side wall of the vacuum recipient, there is provided a substrate handling opening and in the screen, a substrate handling cut-out. A drivingly,...
Gespeichert in:
Hauptverfasser: | , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | Weichart, Jurgen Balon, Frantisek |
description | A vacuum treatment chamber includes a vacuum recipient and therein a screen. Within the screen there is provided a stationary substrate support. Within the side wall of the vacuum recipient, there is provided a substrate handling opening and in the screen, a substrate handling cut-out. A drivingly, moveable screen-shutter frees or covers the substrate handling cut-out in the screen. Thereby, horizontal loading and un-loading (L/UL) of a substrate to the stationary substrate support is possible, although establishing an overall closed screen, once a substrate is treated in the vacuum treatment chamber. |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US11145495B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US11145495B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US11145495B23</originalsourceid><addsrcrecordid>eNqNizsOwjAQBd1QIOAOmwOkMCQFLSiInk-FFG3sNUaKP7LXnB8XFJRUozd6sxSPO6pSHHAiZEeeQVl0EyVAr8ER26AhGHDoi0HFJb38ExDePxlpiHNFmy3GOnKZMqcq1mJhcM60-XIlmtNwPZ5bimGkHFGRJx5vFyll13f7_rDd_fP5ANyIPFc</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Vacuum treatment chamber and method of manufacturing a vacuum treated plate-shaped substrate</title><source>esp@cenet</source><creator>Weichart, Jurgen ; Balon, Frantisek</creator><creatorcontrib>Weichart, Jurgen ; Balon, Frantisek</creatorcontrib><description>A vacuum treatment chamber includes a vacuum recipient and therein a screen. Within the screen there is provided a stationary substrate support. Within the side wall of the vacuum recipient, there is provided a substrate handling opening and in the screen, a substrate handling cut-out. A drivingly, moveable screen-shutter frees or covers the substrate handling cut-out in the screen. Thereby, horizontal loading and un-loading (L/UL) of a substrate to the stationary substrate support is possible, although establishing an overall closed screen, once a substrate is treated in the vacuum treatment chamber.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRICITY</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20211012&DB=EPODOC&CC=US&NR=11145495B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20211012&DB=EPODOC&CC=US&NR=11145495B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Weichart, Jurgen</creatorcontrib><creatorcontrib>Balon, Frantisek</creatorcontrib><title>Vacuum treatment chamber and method of manufacturing a vacuum treated plate-shaped substrate</title><description>A vacuum treatment chamber includes a vacuum recipient and therein a screen. Within the screen there is provided a stationary substrate support. Within the side wall of the vacuum recipient, there is provided a substrate handling opening and in the screen, a substrate handling cut-out. A drivingly, moveable screen-shutter frees or covers the substrate handling cut-out in the screen. Thereby, horizontal loading and un-loading (L/UL) of a substrate to the stationary substrate support is possible, although establishing an overall closed screen, once a substrate is treated in the vacuum treatment chamber.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRICITY</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2021</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNizsOwjAQBd1QIOAOmwOkMCQFLSiInk-FFG3sNUaKP7LXnB8XFJRUozd6sxSPO6pSHHAiZEeeQVl0EyVAr8ER26AhGHDoi0HFJb38ExDePxlpiHNFmy3GOnKZMqcq1mJhcM60-XIlmtNwPZ5bimGkHFGRJx5vFyll13f7_rDd_fP5ANyIPFc</recordid><startdate>20211012</startdate><enddate>20211012</enddate><creator>Weichart, Jurgen</creator><creator>Balon, Frantisek</creator><scope>EVB</scope></search><sort><creationdate>20211012</creationdate><title>Vacuum treatment chamber and method of manufacturing a vacuum treated plate-shaped substrate</title><author>Weichart, Jurgen ; Balon, Frantisek</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US11145495B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2021</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRICITY</topic><toplevel>online_resources</toplevel><creatorcontrib>Weichart, Jurgen</creatorcontrib><creatorcontrib>Balon, Frantisek</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Weichart, Jurgen</au><au>Balon, Frantisek</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Vacuum treatment chamber and method of manufacturing a vacuum treated plate-shaped substrate</title><date>2021-10-12</date><risdate>2021</risdate><abstract>A vacuum treatment chamber includes a vacuum recipient and therein a screen. Within the screen there is provided a stationary substrate support. Within the side wall of the vacuum recipient, there is provided a substrate handling opening and in the screen, a substrate handling cut-out. A drivingly, moveable screen-shutter frees or covers the substrate handling cut-out in the screen. Thereby, horizontal loading and un-loading (L/UL) of a substrate to the stationary substrate support is possible, although establishing an overall closed screen, once a substrate is treated in the vacuum treatment chamber.</abstract><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | eng |
recordid | cdi_epo_espacenet_US11145495B2 |
source | esp@cenet |
subjects | BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY |
title | Vacuum treatment chamber and method of manufacturing a vacuum treated plate-shaped substrate |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-01T04%3A05%3A33IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Weichart,%20Jurgen&rft.date=2021-10-12&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS11145495B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |