Vacuum treatment chamber and method of manufacturing a vacuum treated plate-shaped substrate

A vacuum treatment chamber includes a vacuum recipient and therein a screen. Within the screen there is provided a stationary substrate support. Within the side wall of the vacuum recipient, there is provided a substrate handling opening and in the screen, a substrate handling cut-out. A drivingly,...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Weichart, Jurgen, Balon, Frantisek
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A vacuum treatment chamber includes a vacuum recipient and therein a screen. Within the screen there is provided a stationary substrate support. Within the side wall of the vacuum recipient, there is provided a substrate handling opening and in the screen, a substrate handling cut-out. A drivingly, moveable screen-shutter frees or covers the substrate handling cut-out in the screen. Thereby, horizontal loading and un-loading (L/UL) of a substrate to the stationary substrate support is possible, although establishing an overall closed screen, once a substrate is treated in the vacuum treatment chamber.