Systems and methods for thermally conditioning a wafer in a charged particle beam apparatus

An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including a thermal conditioning station for preconditioning a temperature of a wafer is disclosed. The charged particle beam apparatus may scan the wafer to measure one or more characteristic...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Van Heumen, Martijn Petrus Christianus, Gosen, Jeroen Gerard
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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