Substrate cleaning apparatus and cleaning method using the same

Substrate cleaning apparatus and cleaning method using the same

A substrate cleaning method includes: sequentially loading each of a plurality of substrates, one substrate substantially immediately after a preceding substrate, into an input unit, in which adjacent substrates of the plurality of substrates are spaced apart from each other by a predetermined first...

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Hauptverfasser: Jang, Sukchang, Lim, Dongmin, Kwon, Taeyoung
Format: Patent
Sprache:eng
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BASIC ELECTRIC ELEMENTS
CLEANING
CLEANING IN GENERAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PERFORMING OPERATIONS
PREVENTION OF FOULING IN GENERAL
SEMICONDUCTOR DEVICES
TRANSPORTING
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creator Jang, Sukchang
Lim, Dongmin
Kwon, Taeyoung
description A substrate cleaning method includes: sequentially loading each of a plurality of substrates, one substrate substantially immediately after a preceding substrate, into an input unit, in which adjacent substrates of the plurality of substrates are spaced apart from each other by a predetermined first interval; sequentially transferring each of the plurality of substrates in which adjacent substrates of the plurality of substrates are separated by a predetermined second interval that is greater than the predetermined first interval; cleaning each of the plurality of substrates in a cleaning unit; and aligning, in an output unit, adjacent substrates to be separated by the predetermined first interval.
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subjects BASIC ELECTRIC ELEMENTS
CLEANING
CLEANING IN GENERAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PERFORMING OPERATIONS
PREVENTION OF FOULING IN GENERAL
SEMICONDUCTOR DEVICES
TRANSPORTING
title Substrate cleaning apparatus and cleaning method using the same
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