Multi-channel overlay metrology

An overlay metrology system includes a multi-channel energy unit that selectively operates in a first mode to deliver first photons having a first wavelength to an object under test, and a second mode to deliver second photons to the object under test. The second photons have a second wavelength dif...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Muthinti, Gangadhara Raja, Kanakasabapathy, Siva, Felix, Nelson, Koay, Chiew-Seng
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator Muthinti, Gangadhara Raja
Kanakasabapathy, Siva
Felix, Nelson
Koay, Chiew-Seng
description An overlay metrology system includes a multi-channel energy unit that selectively operates in a first mode to deliver first photons having a first wavelength to an object under test, and a second mode to deliver second photons to the object under test. The second photons have a second wavelength different from the first wavelength. The overlay metrology system further includes an electronic controller that selectively activates either the first mode or the second mode based at least in part on at least one characteristic of an object under test, and that generates the first protons or the second photons to detect at least one buried structure included in the object under test.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US11054250B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US11054250B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US11054250B23</originalsourceid><addsrcrecordid>eNrjZJD3Lc0pydRNzkjMy0vNUcgvSy3KSaxUyE0tKcrPyU-v5GFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8aHBhoYGpiZGpgZORsbEqAEAS2wlUw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Multi-channel overlay metrology</title><source>esp@cenet</source><creator>Muthinti, Gangadhara Raja ; Kanakasabapathy, Siva ; Felix, Nelson ; Koay, Chiew-Seng</creator><creatorcontrib>Muthinti, Gangadhara Raja ; Kanakasabapathy, Siva ; Felix, Nelson ; Koay, Chiew-Seng</creatorcontrib><description>An overlay metrology system includes a multi-channel energy unit that selectively operates in a first mode to deliver first photons having a first wavelength to an object under test, and a second mode to deliver second photons to the object under test. The second photons have a second wavelength different from the first wavelength. The overlay metrology system further includes an electronic controller that selectively activates either the first mode or the second mode based at least in part on at least one characteristic of an object under test, and that generates the first protons or the second photons to detect at least one buried structure included in the object under test.</description><language>eng</language><subject>MEASURING ; MEASURING ANGLES ; MEASURING AREAS ; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS ; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ; PHYSICS ; TESTING</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20210706&amp;DB=EPODOC&amp;CC=US&amp;NR=11054250B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76294</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20210706&amp;DB=EPODOC&amp;CC=US&amp;NR=11054250B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Muthinti, Gangadhara Raja</creatorcontrib><creatorcontrib>Kanakasabapathy, Siva</creatorcontrib><creatorcontrib>Felix, Nelson</creatorcontrib><creatorcontrib>Koay, Chiew-Seng</creatorcontrib><title>Multi-channel overlay metrology</title><description>An overlay metrology system includes a multi-channel energy unit that selectively operates in a first mode to deliver first photons having a first wavelength to an object under test, and a second mode to deliver second photons to the object under test. The second photons have a second wavelength different from the first wavelength. The overlay metrology system further includes an electronic controller that selectively activates either the first mode or the second mode based at least in part on at least one characteristic of an object under test, and that generates the first protons or the second photons to detect at least one buried structure included in the object under test.</description><subject>MEASURING</subject><subject>MEASURING ANGLES</subject><subject>MEASURING AREAS</subject><subject>MEASURING IRREGULARITIES OF SURFACES OR CONTOURS</subject><subject>MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS</subject><subject>PHYSICS</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2021</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJD3Lc0pydRNzkjMy0vNUcgvSy3KSaxUyE0tKcrPyU-v5GFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8aHBhoYGpiZGpgZORsbEqAEAS2wlUw</recordid><startdate>20210706</startdate><enddate>20210706</enddate><creator>Muthinti, Gangadhara Raja</creator><creator>Kanakasabapathy, Siva</creator><creator>Felix, Nelson</creator><creator>Koay, Chiew-Seng</creator><scope>EVB</scope></search><sort><creationdate>20210706</creationdate><title>Multi-channel overlay metrology</title><author>Muthinti, Gangadhara Raja ; Kanakasabapathy, Siva ; Felix, Nelson ; Koay, Chiew-Seng</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US11054250B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2021</creationdate><topic>MEASURING</topic><topic>MEASURING ANGLES</topic><topic>MEASURING AREAS</topic><topic>MEASURING IRREGULARITIES OF SURFACES OR CONTOURS</topic><topic>MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS</topic><topic>PHYSICS</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>Muthinti, Gangadhara Raja</creatorcontrib><creatorcontrib>Kanakasabapathy, Siva</creatorcontrib><creatorcontrib>Felix, Nelson</creatorcontrib><creatorcontrib>Koay, Chiew-Seng</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Muthinti, Gangadhara Raja</au><au>Kanakasabapathy, Siva</au><au>Felix, Nelson</au><au>Koay, Chiew-Seng</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Multi-channel overlay metrology</title><date>2021-07-06</date><risdate>2021</risdate><abstract>An overlay metrology system includes a multi-channel energy unit that selectively operates in a first mode to deliver first photons having a first wavelength to an object under test, and a second mode to deliver second photons to the object under test. The second photons have a second wavelength different from the first wavelength. The overlay metrology system further includes an electronic controller that selectively activates either the first mode or the second mode based at least in part on at least one characteristic of an object under test, and that generates the first protons or the second photons to detect at least one buried structure included in the object under test.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_US11054250B2
source esp@cenet
subjects MEASURING
MEASURING ANGLES
MEASURING AREAS
MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS
PHYSICS
TESTING
title Multi-channel overlay metrology
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-22T22%3A17%3A03IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Muthinti,%20Gangadhara%20Raja&rft.date=2021-07-06&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS11054250B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true