Process for the production of a timepiece provided with a raised external element

The invention relates to a process for the production of a part provided with an external element comprising the following steps:provide an electrically conductive substrate having an upper surface and a pattern forming a recess in said upper surfacedeposit an electrically insulating layer into the...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	Winkler, Yves, Grossenbacher, Pascal, Vuille, Pierry, Bourban, Stewes
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING ORMAINTAINING CLOCKS OR WATCHES APPARATUS THEREFOR BRACELETS CHEMISTRY COINS DECORATIVE ARTS ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES HABERDASHERY HOROLOGY HUMAN NECESSITIES JEWELLERY MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL MECHANICALLY-DRIVEN CLOCKS OR WATCHES METALLURGY MOSAICS OTHER PERSONAL ADORNMENTS PAPERHANGING PERFORMING OPERATIONS PHYSICS PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS PRODUCING DECORATIVE EFFECTS TARSIA WORK TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS TRANSPORTING
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Beschreibung
Zusammenfassung:	The invention relates to a process for the production of a part provided with an external element comprising the following steps:provide an electrically conductive substrate having an upper surface and a pattern forming a recess in said upper surfacedeposit an electrically insulating layer into the pattern so that the insulating layer extends as far as the upper surfacedeposit a metal layer onto the upper surface of the substrate by galvanic growth so that at the end of this step the metal layer partly rests on the insulating layerdissolve the insulating layercover an assembly comprising the substrate and the metal layer with a mass of a base material of the part, wherein the mass forms an imprint of the assemblyseparate the mass and the metal layer from the substrate, wherein the mass then exhibits an external element with a shape corresponding to the imprint of the pattern.