Semiconductor devices and methods for forming semiconductor devices

A method for forming a semiconductor device includes forming a mask layer with a first implantation window on a semiconductor substrate and implanting dopants with a first implantation energy into the semiconductor substrate through the first implantation window to form a first portion of a doping r...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Hilsenbeck, Jochen, Konrath, Jens Peter
Format: Patent
Sprache:eng
Schlagworte:
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