Semiconductor structure including isolations

A semiconductor structure includes a substrate having a first region and a second region defined thereon, a first isolation in the first region, a second isolation in the second region, and a region surrounding the first isolation in the substrate. The substrate includes a first material, and the re...

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Bibliographische Detailangaben
Hauptverfasser: Tsui, Felix Ying-Kit, Chang, Yu-Chi, Lo, Wen-Shun
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A semiconductor structure includes a substrate having a first region and a second region defined thereon, a first isolation in the first region, a second isolation in the second region, and a region surrounding the first isolation in the substrate. The substrate includes a first material, and the region includes the first material and a second material. The first isolation has a first width, the second isolation has a second width, and the first width is greater than the second width. A bottom and sidewalls of the first isolation are in contact with the region, and a bottom and sidewalls of the second isolation are in contact with the substrate.