Positioning device, lithographic apparatus, method for compensating a balance mass torque and device manufacturing method

The present invention relates to a positioning system, including: a first actuator to exert an actuation force on a moveable body, the first actuator being coupled to a balance mass configured to absorb a reaction force resulting from the actuation force, the actuation force providing an acceleratio...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Libourel, Stephan Christiaan Quintus, Van Duijnhoven, Martinus, Leenaars, René Wilhelmus Antonius Hubertus, Braaksma, Dave, Simons, Wilhelmus Franciscus Johannes, Wijckmans, Maurice Willem Jozef Etiënne, Butler, Hans, Cox, Hendrikus Herman Marie
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The present invention relates to a positioning system, including: a first actuator to exert an actuation force on a moveable body, the first actuator being coupled to a balance mass configured to absorb a reaction force resulting from the actuation force, the actuation force providing an acceleration of the moveable body and the reaction force providing an acceleration of the balance mass, wherein a force resulting from the acceleration of the moveable body together with a force resulting from the acceleration of the balance mass result in a balance mass torque; a balance mass support to support the balance mass onto a frame, which balance mass support engages the frame at a support position; and a torque compensator; wherein the torque compensator exerts a compensation force to compensate the balance mass torque, and wherein the torque compensator exerts the compensation force on the frame at the support position.