Method and apparatus for angular-resolved spectroscopic lithography characterization

An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity o...

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Bibliographische Detailangaben
Hauptverfasser:	Bleeker, Arno Jan, Grouwstra, Cedric Desire, Den Boef, Arie Jeffrey, Van Der Schaar, Maurits, Van Dommelen, Youri Johannes Laurentius Maria, Kiers, Antoine Gaston Marie, Van Kraaij, Markus Gerardus Martinus Maria, Dusa, Mircea, Luehrmann, Paul Frank, Pellemans, Henricus Petrus Maria
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MATERIALS THEREFOR MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TESTING
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