Method for fabricating semiconductor device

A method for fabricating a semiconductor device includes stacking a first mold layer and a first supporter layer, forming a first supporter pattern by etching the first supporter layer to expose the first mold layer, forming an insulating layer to cover the exposed first mold layer and the first sup...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Kim, Keun Nam, Hwang, Yoo Sang, Kim, Hui-Jung
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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