Method of controlling a lithographic apparatus and device manufacturing method, control system for a lithographic apparatus and lithographic apparatus

In a method of controlling a lithographic apparatus, historical performance measurements are used to calculate a process model relating to a lithographic process. Current positions of a plurality of alignment marks provided on a current substrate are measured and used to calculate a substrate model...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Bijnen, Franciscus Godefridus Casper, Tinnemans, Patricius Aloysius Jacobus, Lucas, Jorn Kjeld, Hulsebos, Edo Maria, Heres, Pieter Jacob, Van Donkelaar, Ingrid Margaretha Ardina, Brinkhof, Ralph, Verhees, Loek Johannes Petrus
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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