Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substrates

Use of a chemical mechanical polishing (CMP) composition (Q) for chemical mechanical polishing of a substrate (S) comprising (i) cobalt and/or (ii) a cobalt alloy and (iii) Ti N and/or TaN, wherein the CMP composition (Q) comprises (E) Inorganic particles (F) at least one organic compound comprising...

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Bibliographische Detailangaben
Hauptverfasser: Lauter, Michael, Usman Ibrahim, Sheik Ansar, Leunissen, Leonardus, Reichardt, Robert, Proelss, Julian, Lan, Yongqing, Wei, Te Yu, Golzarian, Reza M, Guevenc, Haci Osman, Siebert, Max
Format: Patent
Sprache:eng
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