High brightness laser-produced plasma light source

Laser-produced plasma light source contains a vacuum chamber with a rotating target assembly providing a target in an interaction zone with a laser beam focused on the said target, which is a molten metal layer. A debris shield is rigidly mounted to surround the interaction zone, said shield compris...

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Bibliographische Detailangaben
Hauptverfasser:	Khristoforov, Oleg Borisovich, Koshelev, Konstantin Nikolaevich, Glushkov, Denis Aleksandrovich, Ellwi, Samir, Ivanov, Vladimir Vitalievich, Vinokhodov, Aleksandr Yurievich, Medvedev, Vyacheslav Valerievich, Sidelnikov, Yury Viktorovich, Krivtsun, Vladimir Mikhailovich, Yakushev, Oleg Feliksovich, Krivokorytov, Mikhail Sergeyevich, Lash, Aleksandr Andreevich
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS X-RAY TECHNIQUE
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Beschreibung
Zusammenfassung:	Laser-produced plasma light source contains a vacuum chamber with a rotating target assembly providing a target in an interaction zone with a laser beam focused on the said target, which is a molten metal layer. A debris shield is rigidly mounted to surround the interaction zone, said shield comprising only two opening forming an entrance for the laser beam and an exit for a short-wavelength radiation beam. The means for debris mitigation can additionally include: the rotation of target with high linear velocity exciding 80 m/s; the orientation of the short-wavelength radiation beam and/or of the laser beam at an angle of less than 45° to the target surface, a nozzle supplying a high-speed gas flow to the interaction zone, etc. The technical result is the creation of the high-brightness low-debris sources of soft X-ray, EUV and VUV light at wavelengths of 0.4 to 200 nm.