Pyridinium compounds, a synthesis method therefor, metal or metal alloy plating baths containing said pyridinium compounds and a method for use of said metal or metal alloy plating baths
The plating baths are particularly suitable for use in filling of recessed structures in the electronics and semiconductor industry including dual damascene applications.
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| creator | Brunner, Heiko Jagannathan, Rangarajan Adolf, James Wu, Jun Kohlmann, Lars |
| description | The plating baths are particularly suitable for use in filling of recessed structures in the electronics and semiconductor industry including dual damascene applications. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US10882842B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US10882842B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US10882842B23</originalsourceid><addsrcrecordid>eNqNjbEKwkAMhrs4iPoOca-g1aGzojgK6lyil9qDa3JcrkNfzafzxI6CTkl-_nzfOHue-mCNZdu1cJfWS8dGc0DQnmNDahVaio0YSFegWkL-DtCBhGFB56QH7zBafsANY6MJxRETNQWK1oD_YgFkk0QDPpGhUwKpPx-_JdNsVKNTmg1zks0P-8vuuCAvFanHOzHF6npeLcuyKDfFtlj_03kBg9JfOg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Pyridinium compounds, a synthesis method therefor, metal or metal alloy plating baths containing said pyridinium compounds and a method for use of said metal or metal alloy plating baths</title><source>esp@cenet</source><creator>Brunner, Heiko ; Jagannathan, Rangarajan ; Adolf, James ; Wu, Jun ; Kohlmann, Lars</creator><creatorcontrib>Brunner, Heiko ; Jagannathan, Rangarajan ; Adolf, James ; Wu, Jun ; Kohlmann, Lars</creatorcontrib><description>The plating baths are particularly suitable for use in filling of recessed structures in the electronics and semiconductor industry including dual damascene applications.</description><language>eng</language><subject>APPARATUS THEREFOR ; CHEMISTRY ; ELECTROFORMING ; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES ; HETEROCYCLIC COMPOUNDS ; METALLURGY ; ORGANIC CHEMISTRY ; PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210105&DB=EPODOC&CC=US&NR=10882842B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210105&DB=EPODOC&CC=US&NR=10882842B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Brunner, Heiko</creatorcontrib><creatorcontrib>Jagannathan, Rangarajan</creatorcontrib><creatorcontrib>Adolf, James</creatorcontrib><creatorcontrib>Wu, Jun</creatorcontrib><creatorcontrib>Kohlmann, Lars</creatorcontrib><title>Pyridinium compounds, a synthesis method therefor, metal or metal alloy plating baths containing said pyridinium compounds and a method for use of said metal or metal alloy plating baths</title><description>The plating baths are particularly suitable for use in filling of recessed structures in the electronics and semiconductor industry including dual damascene applications.</description><subject>APPARATUS THEREFOR</subject><subject>CHEMISTRY</subject><subject>ELECTROFORMING</subject><subject>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</subject><subject>HETEROCYCLIC COMPOUNDS</subject><subject>METALLURGY</subject><subject>ORGANIC CHEMISTRY</subject><subject>PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2021</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjbEKwkAMhrs4iPoOca-g1aGzojgK6lyil9qDa3JcrkNfzafzxI6CTkl-_nzfOHue-mCNZdu1cJfWS8dGc0DQnmNDahVaio0YSFegWkL-DtCBhGFB56QH7zBafsANY6MJxRETNQWK1oD_YgFkk0QDPpGhUwKpPx-_JdNsVKNTmg1zks0P-8vuuCAvFanHOzHF6npeLcuyKDfFtlj_03kBg9JfOg</recordid><startdate>20210105</startdate><enddate>20210105</enddate><creator>Brunner, Heiko</creator><creator>Jagannathan, Rangarajan</creator><creator>Adolf, James</creator><creator>Wu, Jun</creator><creator>Kohlmann, Lars</creator><scope>EVB</scope></search><sort><creationdate>20210105</creationdate><title>Pyridinium compounds, a synthesis method therefor, metal or metal alloy plating baths containing said pyridinium compounds and a method for use of said metal or metal alloy plating baths</title><author>Brunner, Heiko ; Jagannathan, Rangarajan ; Adolf, James ; Wu, Jun ; Kohlmann, Lars</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US10882842B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2021</creationdate><topic>APPARATUS THEREFOR</topic><topic>CHEMISTRY</topic><topic>ELECTROFORMING</topic><topic>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</topic><topic>HETEROCYCLIC COMPOUNDS</topic><topic>METALLURGY</topic><topic>ORGANIC CHEMISTRY</topic><topic>PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</topic><toplevel>online_resources</toplevel><creatorcontrib>Brunner, Heiko</creatorcontrib><creatorcontrib>Jagannathan, Rangarajan</creatorcontrib><creatorcontrib>Adolf, James</creatorcontrib><creatorcontrib>Wu, Jun</creatorcontrib><creatorcontrib>Kohlmann, Lars</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Brunner, Heiko</au><au>Jagannathan, Rangarajan</au><au>Adolf, James</au><au>Wu, Jun</au><au>Kohlmann, Lars</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Pyridinium compounds, a synthesis method therefor, metal or metal alloy plating baths containing said pyridinium compounds and a method for use of said metal or metal alloy plating baths</title><date>2021-01-05</date><risdate>2021</risdate><abstract>The plating baths are particularly suitable for use in filling of recessed structures in the electronics and semiconductor industry including dual damascene applications.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS THEREFOR CHEMISTRY ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES HETEROCYCLIC COMPOUNDS METALLURGY ORGANIC CHEMISTRY PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS |
| title | Pyridinium compounds, a synthesis method therefor, metal or metal alloy plating baths containing said pyridinium compounds and a method for use of said metal or metal alloy plating baths |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-08T03%3A50%3A18IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Brunner,%20Heiko&rft.date=2021-01-05&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS10882842B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |