Vacuum apparatus and charged particle beam writing apparatus

Vacuum apparatus and charged particle beam writing apparatus

A vacuum apparatus according to an embodiment includes a chamber configured air-tightly, a vacuum pump configured to exhaust gas from the chamber, and an exhaustion structure placed between the chamber and an inlet port of the vacuum pump and having a ventilation path surrounded by a wall of the exh...

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Hauptverfasser: Ideno, Keita, Nishiyama, Tetsuro, Saito, Hiroyasu
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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creator Ideno, Keita
Nishiyama, Tetsuro
Saito, Hiroyasu
description A vacuum apparatus according to an embodiment includes a chamber configured air-tightly, a vacuum pump configured to exhaust gas from the chamber, and an exhaustion structure placed between the chamber and an inlet port of the vacuum pump and having a ventilation path surrounded by a wall of the exhaustion structure. The vacuum pump exhausts gas from the chamber through the ventilation path of the exhaustion structure. A layer of thermal energy absorbing material is formed on at least part of an inner surface of the wall of the exhaustion structure to absorb energy of thermal radiation emitted from the inlet port of the vacuum pump.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US10867769B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US10867769B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US10867769B23</originalsourceid><addsrcrecordid>eNrjZLAJS0wuLc1VSCwoSCxKLCktVkjMS1FIzkgsSk9NUQCKlWQm56QqJKUm5iqUF2WWZOalI9TyMLCmJeYUp_JCaW4GRTfXEGcP3dSC_PjU4oLE5NS81JL40GBDAwszc3MzSycjY2LUAAAFGzBQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Vacuum apparatus and charged particle beam writing apparatus</title><source>esp@cenet</source><creator>Ideno, Keita ; Nishiyama, Tetsuro ; Saito, Hiroyasu</creator><creatorcontrib>Ideno, Keita ; Nishiyama, Tetsuro ; Saito, Hiroyasu</creatorcontrib><description>A vacuum apparatus according to an embodiment includes a chamber configured air-tightly, a vacuum pump configured to exhaust gas from the chamber, and an exhaustion structure placed between the chamber and an inlet port of the vacuum pump and having a ventilation path surrounded by a wall of the exhaustion structure. The vacuum pump exhausts gas from the chamber through the ventilation path of the exhaustion structure. A layer of thermal energy absorbing material is formed on at least part of an inner surface of the wall of the exhaustion structure to absorb energy of thermal radiation emitted from the inlet port of the vacuum pump.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRICITY</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20201215&amp;DB=EPODOC&amp;CC=US&amp;NR=10867769B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20201215&amp;DB=EPODOC&amp;CC=US&amp;NR=10867769B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Ideno, Keita</creatorcontrib><creatorcontrib>Nishiyama, Tetsuro</creatorcontrib><creatorcontrib>Saito, Hiroyasu</creatorcontrib><title>Vacuum apparatus and charged particle beam writing apparatus</title><description>A vacuum apparatus according to an embodiment includes a chamber configured air-tightly, a vacuum pump configured to exhaust gas from the chamber, and an exhaustion structure placed between the chamber and an inlet port of the vacuum pump and having a ventilation path surrounded by a wall of the exhaustion structure. The vacuum pump exhausts gas from the chamber through the ventilation path of the exhaustion structure. A layer of thermal energy absorbing material is formed on at least part of an inner surface of the wall of the exhaustion structure to absorb energy of thermal radiation emitted from the inlet port of the vacuum pump.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRICITY</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLAJS0wuLc1VSCwoSCxKLCktVkjMS1FIzkgsSk9NUQCKlWQm56QqJKUm5iqUF2WWZOalI9TyMLCmJeYUp_JCaW4GRTfXEGcP3dSC_PjU4oLE5NS81JL40GBDAwszc3MzSycjY2LUAAAFGzBQ</recordid><startdate>20201215</startdate><enddate>20201215</enddate><creator>Ideno, Keita</creator><creator>Nishiyama, Tetsuro</creator><creator>Saito, Hiroyasu</creator><scope>EVB</scope></search><sort><creationdate>20201215</creationdate><title>Vacuum apparatus and charged particle beam writing apparatus</title><author>Ideno, Keita ; Nishiyama, Tetsuro ; Saito, Hiroyasu</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US10867769B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2020</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRICITY</topic><toplevel>online_resources</toplevel><creatorcontrib>Ideno, Keita</creatorcontrib><creatorcontrib>Nishiyama, Tetsuro</creatorcontrib><creatorcontrib>Saito, Hiroyasu</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Ideno, Keita</au><au>Nishiyama, Tetsuro</au><au>Saito, Hiroyasu</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Vacuum apparatus and charged particle beam writing apparatus</title><date>2020-12-15</date><risdate>2020</risdate><abstract>A vacuum apparatus according to an embodiment includes a chamber configured air-tightly, a vacuum pump configured to exhaust gas from the chamber, and an exhaustion structure placed between the chamber and an inlet port of the vacuum pump and having a ventilation path surrounded by a wall of the exhaustion structure. The vacuum pump exhausts gas from the chamber through the ventilation path of the exhaustion structure. A layer of thermal energy absorbing material is formed on at least part of an inner surface of the wall of the exhaustion structure to absorb energy of thermal radiation emitted from the inlet port of the vacuum pump.</abstract><oa>free_for_read</oa></addata></record>
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
title Vacuum apparatus and charged particle beam writing apparatus
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-20T23%3A14%3A47IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Ideno,%20Keita&rft.date=2020-12-15&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS10867769B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true