Reticle-masking structure, extreme ultraviolet apparatus, and method of forming the same

Reticle-masking structure, extreme ultraviolet apparatus, and method of forming the same

A reticle-masking structure is provided. The reticle-masking structure includes a magnetic substrate and a paramagnetic part disposed on the magnetic substrate. The magnetic substrate has a magnetic field, and the paramagnetic part has an induced magnetic field in a direction of the magnetic field o...

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Hauptverfasser: Hwang, James Jeng-Jyi, Hsu, Ching-Hsiang, Hsu, Feng Yuan
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Sprache:eng
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APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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creator Hwang, James Jeng-Jyi
Hsu, Ching-Hsiang
Hsu, Feng Yuan
description A reticle-masking structure is provided. The reticle-masking structure includes a magnetic substrate and a paramagnetic part disposed on the magnetic substrate. The magnetic substrate has a magnetic field, and the paramagnetic part has an induced magnetic field in a direction of the magnetic field of the magnetic substrate. The paramagnetic part includes a rough surface defined by a plurality of protrusion structures of the paramagnetic part. A method for forming a reticle-masking structure and an extreme ultraviolet apparatus are also provided.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US10866519B1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US10866519B1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US10866519B13</originalsourceid><addsrcrecordid>eNqNy70KwjAUhuEuDqLew3FvwSCWuiqKsz_gVg7pF1tMmpCciJcvghfg9C7POy3uZ8igLSrH6TmMD0oSs5YcURLeEuFA2Urk1-AthDgEjiw5lcRjRw7S-468IeOj-_7SgxI7zIuJYZuw-HVWLI-H6_5UIfgWKbDGCGlvF7Vq6nqjtju1_sd8AOFtOsk</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Reticle-masking structure, extreme ultraviolet apparatus, and method of forming the same</title><source>esp@cenet</source><creator>Hwang, James Jeng-Jyi ; Hsu, Ching-Hsiang ; Hsu, Feng Yuan</creator><creatorcontrib>Hwang, James Jeng-Jyi ; Hsu, Ching-Hsiang ; Hsu, Feng Yuan</creatorcontrib><description>A reticle-masking structure is provided. The reticle-masking structure includes a magnetic substrate and a paramagnetic part disposed on the magnetic substrate. The magnetic substrate has a magnetic field, and the paramagnetic part has an induced magnetic field in a direction of the magnetic field of the magnetic substrate. The paramagnetic part includes a rough surface defined by a plurality of protrusion structures of the paramagnetic part. A method for forming a reticle-masking structure and an extreme ultraviolet apparatus are also provided.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20201215&amp;DB=EPODOC&amp;CC=US&amp;NR=10866519B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20201215&amp;DB=EPODOC&amp;CC=US&amp;NR=10866519B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Hwang, James Jeng-Jyi</creatorcontrib><creatorcontrib>Hsu, Ching-Hsiang</creatorcontrib><creatorcontrib>Hsu, Feng Yuan</creatorcontrib><title>Reticle-masking structure, extreme ultraviolet apparatus, and method of forming the same</title><description>A reticle-masking structure is provided. The reticle-masking structure includes a magnetic substrate and a paramagnetic part disposed on the magnetic substrate. The magnetic substrate has a magnetic field, and the paramagnetic part has an induced magnetic field in a direction of the magnetic field of the magnetic substrate. The paramagnetic part includes a rough surface defined by a plurality of protrusion structures of the paramagnetic part. A method for forming a reticle-masking structure and an extreme ultraviolet apparatus are also provided.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNy70KwjAUhuEuDqLew3FvwSCWuiqKsz_gVg7pF1tMmpCciJcvghfg9C7POy3uZ8igLSrH6TmMD0oSs5YcURLeEuFA2Urk1-AthDgEjiw5lcRjRw7S-468IeOj-_7SgxI7zIuJYZuw-HVWLI-H6_5UIfgWKbDGCGlvF7Vq6nqjtju1_sd8AOFtOsk</recordid><startdate>20201215</startdate><enddate>20201215</enddate><creator>Hwang, James Jeng-Jyi</creator><creator>Hsu, Ching-Hsiang</creator><creator>Hsu, Feng Yuan</creator><scope>EVB</scope></search><sort><creationdate>20201215</creationdate><title>Reticle-masking structure, extreme ultraviolet apparatus, and method of forming the same</title><author>Hwang, James Jeng-Jyi ; Hsu, Ching-Hsiang ; Hsu, Feng Yuan</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US10866519B13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2020</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>Hwang, James Jeng-Jyi</creatorcontrib><creatorcontrib>Hsu, Ching-Hsiang</creatorcontrib><creatorcontrib>Hsu, Feng Yuan</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Hwang, James Jeng-Jyi</au><au>Hsu, Ching-Hsiang</au><au>Hsu, Feng Yuan</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Reticle-masking structure, extreme ultraviolet apparatus, and method of forming the same</title><date>2020-12-15</date><risdate>2020</risdate><abstract>A reticle-masking structure is provided. The reticle-masking structure includes a magnetic substrate and a paramagnetic part disposed on the magnetic substrate. The magnetic substrate has a magnetic field, and the paramagnetic part has an induced magnetic field in a direction of the magnetic field of the magnetic substrate. The paramagnetic part includes a rough surface defined by a plurality of protrusion structures of the paramagnetic part. A method for forming a reticle-masking structure and an extreme ultraviolet apparatus are also provided.</abstract><oa>free_for_read</oa></addata></record>
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subjects APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
title Reticle-masking structure, extreme ultraviolet apparatus, and method of forming the same
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-02T00%3A59%3A57IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Hwang,%20James%20Jeng-Jyi&rft.date=2020-12-15&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS10866519B1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true