Process chamber for a supercritical process and apparatus for treating substrates having the same

Disclosed are a supercritical process chamber and an apparatus having the same. The process chamber includes a body frame having a protrusion protruding in an upward vertical direction from a first surface of the body frame and a recess defined by the protrusion and the first surface of the body fra...

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Bibliographische Detailangaben

Hauptverfasser:	Cho, Yong-Jhin, Gil, Yeon-Jin, Park, Sang-Jine, Lee, Kwang-Wook, Ko, Yong-Sun, Cho, Byung-Kwon
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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