Fin field-effect transistor device and method

A method includes forming a first fin protruding above a substrate, the first fin having a PMOS region; forming a first gate structure over the first fin in the PMOS region; forming a first spacer layer over the first fin and the first gate structure; and forming a second spacer layer over the first...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Li, Chun Te, Hsu, Chih-Peng, Lin, Wei-Ken
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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