Source/drain contacts for non-planar transistors
The present description relates to the field of fabricating microelectronic devices having non-planar transistors. Embodiments of the present description relate to the formation of source/drain contacts within non-planar transistors, wherein a titanium-containing contact interface may be used in the...
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creator | Pradhan, Sameer S Chun, Jin-Sung Joshi, Subhash M |
description | The present description relates to the field of fabricating microelectronic devices having non-planar transistors. Embodiments of the present description relate to the formation of source/drain contacts within non-planar transistors, wherein a titanium-containing contact interface may be used in the formation of the source/drain contact with a discreet titanium silicide formed between the titanium-containing interface and a silicon-containing source/drain structure. |
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Embodiments of the present description relate to the formation of source/drain contacts within non-planar transistors, wherein a titanium-containing contact interface may be used in the formation of the source/drain contact with a discreet titanium silicide formed between the titanium-containing interface and a silicon-containing source/drain structure.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200908&DB=EPODOC&CC=US&NR=10770591B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76516</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200908&DB=EPODOC&CC=US&NR=10770591B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Pradhan, Sameer S</creatorcontrib><creatorcontrib>Chun, Jin-Sung</creatorcontrib><creatorcontrib>Joshi, Subhash M</creatorcontrib><title>Source/drain contacts for non-planar transistors</title><description>The present description relates to the field of fabricating microelectronic devices having non-planar transistors. Embodiments of the present description relate to the formation of source/drain contacts within non-planar transistors, wherein a titanium-containing contact interface may be used in the formation of the source/drain contact with a discreet titanium silicide formed between the titanium-containing interface and a silicon-containing source/drain structure.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDAIzi8tSk7VTylKzMxTSM7PK0lMLilWSMsvUsjLz9MtyEnMSyxSKClKzCvOLC7JLyrmYWBNS8wpTuWF0twMim6uIc4euqkF-fGpxQWJyal5qSXxocGGBubmBqaWhk5GxsSoAQCKwyvd</recordid><startdate>20200908</startdate><enddate>20200908</enddate><creator>Pradhan, Sameer S</creator><creator>Chun, Jin-Sung</creator><creator>Joshi, Subhash M</creator><scope>EVB</scope></search><sort><creationdate>20200908</creationdate><title>Source/drain contacts for non-planar transistors</title><author>Pradhan, Sameer S ; Chun, Jin-Sung ; Joshi, Subhash M</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US10770591B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2020</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>Pradhan, Sameer S</creatorcontrib><creatorcontrib>Chun, Jin-Sung</creatorcontrib><creatorcontrib>Joshi, Subhash M</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Pradhan, Sameer S</au><au>Chun, Jin-Sung</au><au>Joshi, Subhash M</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Source/drain contacts for non-planar transistors</title><date>2020-09-08</date><risdate>2020</risdate><abstract>The present description relates to the field of fabricating microelectronic devices having non-planar transistors. Embodiments of the present description relate to the formation of source/drain contacts within non-planar transistors, wherein a titanium-containing contact interface may be used in the formation of the source/drain contact with a discreet titanium silicide formed between the titanium-containing interface and a silicon-containing source/drain structure.</abstract><oa>free_for_read</oa></addata></record> |
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title | Source/drain contacts for non-planar transistors |
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