Preheat processes for millisecond anneal system

Preheat processes for a millisecond anneal system are provided. In one example implementation, a preheat process can include receiving a substrate on a wafer support plate in a processing chamber of a millisecond anneal system; obtaining one or more temperature measurements of the wafer support plat...

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Bibliographische Detailangaben

Hauptverfasser:	Hagedorn, Markus, Lieberer, Markus, Cosceev, Alexandr, Pfahler, Christian, vanAbbema, Michael
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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