Wafer dicing using femtosecond-based laser and plasma etch

Methods of dicing semiconductor wafers, each wafer having a plurality of integrated circuits, are described. A method includes forming a mask above the semiconductor wafer, the mask including a layer covering and protecting the integrated circuits. The mask and a portion of the semiconductor wafer a...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Yalamanchili, Madhava Rao, Singh, Saravjeet, Lei, Wei-Sheng, Kumar, Ajay, Eaton, Brad, Holden, James M
Format: Patent
Sprache:eng
Schlagworte:
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