Lithographic apparatus and device manufacturing method

A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively...

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Bibliographische Detailangaben
Hauptverfasser:	Teunissen, Franciscus Johannes Herman Maria, Van Der Toorn, Jan-Gerard Cornelis, Van Der Meulen, Frits, Leenders, Martinus Hendrikus Antonius, Verhagen, Martinus Cornelis Maria, De Graaf, Roelof Frederik, Van Gompel, Edwin Augustinus Matheus, Hoogendam, Christiaan Alexander, Polizzi, Marco, Donders, Sjoerd Nicolaas Lambertus, Ten Kate, Nicolaas, Vogel, Herman, Cox, Henrikus Herman Marie, Belfroid, Stefan Philip Christiaan, Ottens, Joost Jeroen, Smeulers, Johannes Petrus Maria, Mertens, Jeroen Johannes Sophia Maria, Kemper, Nicolaas Rudolf
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.