Method for forming semiconductor device structure

A method for forming a semiconductor device structure is provided. The semiconductor device structure includes forming a film over a substrate. The semiconductor device structure includes forming a first mask layer over the film. The semiconductor device structure includes forming a second mask laye...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Chen, Po-Zen, Chen, Yi-Hung, Chen, Yi-Jie, Liao, Keng-Ying, Tseng, Chung-Bin
Format: Patent
Sprache:eng
Schlagworte:
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