Selective deposition defects removal by chemical etch
Methods of depositing a film selectively onto a first substrate surface relative to a second substrate surface are described. The methods include exposing a substrate to a blocking molecule to selectively deposit a blocking layer on the first surface. A layer is selectively formed on the second surf...
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| creator | Zhou, Lei Schmiege, Benjamin Jackson, Michael S Ma, Paul F Wu, Liqi Ke, Chang Jian, Guoqiang Anthis, Jeffrey W Jain, Pratham |
| description | Methods of depositing a film selectively onto a first substrate surface relative to a second substrate surface are described. The methods include exposing a substrate to a blocking molecule to selectively deposit a blocking layer on the first surface. A layer is selectively formed on the second surface and defects of the layer are formed on the blocking layer. The defects are removed from the blocking layer on the first surface. |
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| subjects | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
| title | Selective deposition defects removal by chemical etch |
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