Laser source device and extreme ultraviolet lithography device

A device includes a laser source, an amplifier, an optical sensor and a spectrometer. The laser source is configured to produce a seed laser beam. The amplifier includes gain medium and a discharging unit. The discharging unit is configured to pump the gain medium for amplifying power of the seed la...

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Hauptverfasser: Tong, Henry Yee-Shian, Chen, Cheng-Chieh, Chen, Hsin-Liang, Wang, Wen-Chih, Chen, Li-Jui, Tsay, Jeng-Yann, Chang, Louis Chun-Lin, Cheng, Po-Chung
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creator Tong, Henry Yee-Shian
Chen, Cheng-Chieh
Chen, Hsin-Liang
Wang, Wen-Chih
Chen, Li-Jui
Tsay, Jeng-Yann
Chang, Louis Chun-Lin
Cheng, Po-Chung
description A device includes a laser source, an amplifier, an optical sensor and a spectrometer. The laser source is configured to produce a seed laser beam. The amplifier includes gain medium and a discharging unit. The discharging unit is configured to pump the gain medium for amplifying power of the seed laser beam. The optical sensor is coupled to the amplifier and configured for sensing an optical emission generated in the amplifier while the gain medium is discharging. The spectrometer is coupled with the optical sensor and configured to measure a spectrum of the optical emission.
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subjects APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
COLORIMETRY
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT
MEASURING
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
RADIATION PYROMETRY
TESTING
X-RAY TECHNIQUE
title Laser source device and extreme ultraviolet lithography device
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