Electrostatic chuck device
An electrostatic chuck device includes: a placing plate having a placement surface on which a plate-like sample is placed on one side thereof; an electrostatic attraction electrode provided on the other side of the first ceramic plate; and a first organic insulating layer provided between the first...
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| creator | Maeta, Shinichi Kosakai, Mamoru Maeda, Keisuke |
| description | An electrostatic chuck device includes: a placing plate having a placement surface on which a plate-like sample is placed on one side thereof; an electrostatic attraction electrode provided on the other side of the first ceramic plate; and a first organic insulating layer provided between the first ceramic plate and the electrostatic attraction electrode. The electrostatic chuck device further has a supporting plate provided between the first organic insulating layer and the electrostatic attraction electrode. |
| format | Patent |
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The electrostatic chuck device further has a supporting plate provided between the first organic insulating layer and the electrostatic attraction electrode.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; CORONA DEVICES ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES ; OVERVOLTAGE ARRESTERS USING SPARK GAPS ; SEMICONDUCTOR DEVICES ; SPARK GAPS ; SPARKING PLUGS</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200414&DB=EPODOC&CC=US&NR=10622239B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200414&DB=EPODOC&CC=US&NR=10622239B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Maeta, Shinichi</creatorcontrib><creatorcontrib>Kosakai, Mamoru</creatorcontrib><creatorcontrib>Maeda, Keisuke</creatorcontrib><title>Electrostatic chuck device</title><description>An electrostatic chuck device includes: a placing plate having a placement surface on which a plate-like sample is placed on one side thereof; an electrostatic attraction electrode provided on the other side of the first ceramic plate; and a first organic insulating layer provided between the first ceramic plate and the electrostatic attraction electrode. The electrostatic chuck device further has a supporting plate provided between the first organic insulating layer and the electrostatic attraction electrode.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CORONA DEVICES</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES</subject><subject>OVERVOLTAGE ARRESTERS USING SPARK GAPS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SPARK GAPS</subject><subject>SPARKING PLUGS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJByzUlNLinKLy5JLMlMVkjOKE3OVkhJLctMTuVhYE1LzClO5YXS3AyKbq4hzh66qQX58anFBYnJqXmpJfGhwYYGZkZGRsaWTkbGxKgBAFieIzs</recordid><startdate>20200414</startdate><enddate>20200414</enddate><creator>Maeta, Shinichi</creator><creator>Kosakai, Mamoru</creator><creator>Maeda, Keisuke</creator><scope>EVB</scope></search><sort><creationdate>20200414</creationdate><title>Electrostatic chuck device</title><author>Maeta, Shinichi ; Kosakai, Mamoru ; Maeda, Keisuke</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US10622239B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2020</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CORONA DEVICES</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES</topic><topic>OVERVOLTAGE ARRESTERS USING SPARK GAPS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SPARK GAPS</topic><topic>SPARKING PLUGS</topic><toplevel>online_resources</toplevel><creatorcontrib>Maeta, Shinichi</creatorcontrib><creatorcontrib>Kosakai, Mamoru</creatorcontrib><creatorcontrib>Maeda, Keisuke</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Maeta, Shinichi</au><au>Kosakai, Mamoru</au><au>Maeda, Keisuke</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Electrostatic chuck device</title><date>2020-04-14</date><risdate>2020</risdate><abstract>An electrostatic chuck device includes: a placing plate having a placement surface on which a plate-like sample is placed on one side thereof; an electrostatic attraction electrode provided on the other side of the first ceramic plate; and a first organic insulating layer provided between the first ceramic plate and the electrostatic attraction electrode. The electrostatic chuck device further has a supporting plate provided between the first organic insulating layer and the electrostatic attraction electrode.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS CORONA DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES OVERVOLTAGE ARRESTERS USING SPARK GAPS SEMICONDUCTOR DEVICES SPARK GAPS SPARKING PLUGS |
| title | Electrostatic chuck device |
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