Substrate processing apparatus and nozzle

After a discharge of a processing liquid is stopped, a position of a liquid surface within a nozzle can be observed. A substrate processing apparatus includes a substrate holding mechanism and the nozzle. The substrate holding mechanism is configured to hold a substrate. The nozzle is configured to...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Fukushima, Tsuyoshi, Aiura, Kazuhiro, Ito, Norihiro
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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