Mark structure for aligning layers of integrated circuit structure and methods of forming same

This disclosure relates to a structure for aligning layers of an integrated circuit (IC) structure that may include a first dielectric layer positioned above a semiconductor substrate having one or more active devices, a trench stop layer positioned above the first dielectric layer, a second dielect...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Chen, Zheng G, Ren, Yuping, Tang, Ming Hao, Morgenfeld, Bradley, Chen, Rui
Format: Patent
Sprache:eng
Schlagworte:
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