Power deposition control in inductively coupled plasma (ICP) reactors

Embodiments of inductively coupled plasma (ICP) reactors are provided herein. In some embodiments, a dielectric window for an inductively coupled plasma reactor includes: a body including a first side, a second side opposite the first side, an edge, and a center, wherein the dielectric window has a...

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Bibliographische Detailangaben
Hauptverfasser: Todorow, Valentin N, Banna, Samer, Tantiwong, Kyle, Yuen, Stephen, Gung, Tza-Jing, Marohl, Dan A, Knyazik, Vladimir
Format: Patent
Sprache:eng
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