Semiconductor structure including isolations and method for manufacturing the same

A method for manufacturing a semiconductor structure including isolations includes receiving a substrate including a first region and a second region; forming a patterned hard mask, the patterned hard mask including a first opening exposing a portion of the first region and a second opening exposing...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Tsui, Felix Ying-Kit, Chang, Yu-Chi, Lo, Wen-Shun
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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