Secondary particle detection system of scanning electron microscope
A scanning electron microscope includes: a retarding power source configured to apply a retarding voltage to a specimen; a combined objective lens configured to focus the primary beam on a surface of the specimen; an electrostatic deflection system configured to deflect the primary beam to direct th...
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| creator | Sasaki, Sumio Tanaka, Yukihiro Yamazaki, Yuichiro Kato, Makoto Kubota, Kazufumi Takashima, Susumu |
| description | A scanning electron microscope includes: a retarding power source configured to apply a retarding voltage to a specimen; a combined objective lens configured to focus the primary beam on a surface of the specimen; an electrostatic deflection system configured to deflect the primary beam to direct the primary beam to each point in a field of view on the surface of the specimen; a first scintillation detector having a first scintillator configured to emit light upon incidence of secondary electrons which have been emitted from the specimen; a Wien filter configured to deflect the secondary electrons in one direction without deflecting the primary beam; and a second scintillation detector having a second scintillator configured to detect the secondary electrons deflected by the Wien filter. The second scintillator has a distal end located away from the axis of the primary beam. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US10515778B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US10515778B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US10515778B23</originalsourceid><addsrcrecordid>eNrjZHAOTk3Oz0tJLKpUKEgsKslMzklVSEktSU0uyczPUyiuLC5JzVXIT1MoTk7My8vMS1dIzQHKFQHlcjOTi_KLk_MLUnkYWNMSc4pTeaE0N4Oim2uIs4duakF-fGpxQWJyal5qSXxosKGBqaGpubmFk5ExMWoA05kzWA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Secondary particle detection system of scanning electron microscope</title><source>esp@cenet</source><creator>Sasaki, Sumio ; Tanaka, Yukihiro ; Yamazaki, Yuichiro ; Kato, Makoto ; Kubota, Kazufumi ; Takashima, Susumu</creator><creatorcontrib>Sasaki, Sumio ; Tanaka, Yukihiro ; Yamazaki, Yuichiro ; Kato, Makoto ; Kubota, Kazufumi ; Takashima, Susumu</creatorcontrib><description>A scanning electron microscope includes: a retarding power source configured to apply a retarding voltage to a specimen; a combined objective lens configured to focus the primary beam on a surface of the specimen; an electrostatic deflection system configured to deflect the primary beam to direct the primary beam to each point in a field of view on the surface of the specimen; a first scintillation detector having a first scintillator configured to emit light upon incidence of secondary electrons which have been emitted from the specimen; a Wien filter configured to deflect the secondary electrons in one direction without deflecting the primary beam; and a second scintillation detector having a second scintillator configured to detect the secondary electrons deflected by the Wien filter. The second scintillator has a distal end located away from the axis of the primary beam.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRICITY</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20191224&DB=EPODOC&CC=US&NR=10515778B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20191224&DB=EPODOC&CC=US&NR=10515778B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Sasaki, Sumio</creatorcontrib><creatorcontrib>Tanaka, Yukihiro</creatorcontrib><creatorcontrib>Yamazaki, Yuichiro</creatorcontrib><creatorcontrib>Kato, Makoto</creatorcontrib><creatorcontrib>Kubota, Kazufumi</creatorcontrib><creatorcontrib>Takashima, Susumu</creatorcontrib><title>Secondary particle detection system of scanning electron microscope</title><description>A scanning electron microscope includes: a retarding power source configured to apply a retarding voltage to a specimen; a combined objective lens configured to focus the primary beam on a surface of the specimen; an electrostatic deflection system configured to deflect the primary beam to direct the primary beam to each point in a field of view on the surface of the specimen; a first scintillation detector having a first scintillator configured to emit light upon incidence of secondary electrons which have been emitted from the specimen; a Wien filter configured to deflect the secondary electrons in one direction without deflecting the primary beam; and a second scintillation detector having a second scintillator configured to detect the secondary electrons deflected by the Wien filter. The second scintillator has a distal end located away from the axis of the primary beam.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRICITY</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHAOTk3Oz0tJLKpUKEgsKslMzklVSEktSU0uyczPUyiuLC5JzVXIT1MoTk7My8vMS1dIzQHKFQHlcjOTi_KLk_MLUnkYWNMSc4pTeaE0N4Oim2uIs4duakF-fGpxQWJyal5qSXxosKGBqaGpubmFk5ExMWoA05kzWA</recordid><startdate>20191224</startdate><enddate>20191224</enddate><creator>Sasaki, Sumio</creator><creator>Tanaka, Yukihiro</creator><creator>Yamazaki, Yuichiro</creator><creator>Kato, Makoto</creator><creator>Kubota, Kazufumi</creator><creator>Takashima, Susumu</creator><scope>EVB</scope></search><sort><creationdate>20191224</creationdate><title>Secondary particle detection system of scanning electron microscope</title><author>Sasaki, Sumio ; Tanaka, Yukihiro ; Yamazaki, Yuichiro ; Kato, Makoto ; Kubota, Kazufumi ; Takashima, Susumu</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US10515778B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2019</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRICITY</topic><toplevel>online_resources</toplevel><creatorcontrib>Sasaki, Sumio</creatorcontrib><creatorcontrib>Tanaka, Yukihiro</creatorcontrib><creatorcontrib>Yamazaki, Yuichiro</creatorcontrib><creatorcontrib>Kato, Makoto</creatorcontrib><creatorcontrib>Kubota, Kazufumi</creatorcontrib><creatorcontrib>Takashima, Susumu</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Sasaki, Sumio</au><au>Tanaka, Yukihiro</au><au>Yamazaki, Yuichiro</au><au>Kato, Makoto</au><au>Kubota, Kazufumi</au><au>Takashima, Susumu</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Secondary particle detection system of scanning electron microscope</title><date>2019-12-24</date><risdate>2019</risdate><abstract>A scanning electron microscope includes: a retarding power source configured to apply a retarding voltage to a specimen; a combined objective lens configured to focus the primary beam on a surface of the specimen; an electrostatic deflection system configured to deflect the primary beam to direct the primary beam to each point in a field of view on the surface of the specimen; a first scintillation detector having a first scintillator configured to emit light upon incidence of secondary electrons which have been emitted from the specimen; a Wien filter configured to deflect the secondary electrons in one direction without deflecting the primary beam; and a second scintillation detector having a second scintillator configured to detect the secondary electrons deflected by the Wien filter. The second scintillator has a distal end located away from the axis of the primary beam.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY |
| title | Secondary particle detection system of scanning electron microscope |
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