Structure and method to improve overlay performance in semiconductor devices

In an exemplary method, a first layer is formed on a substrate. First overlay marks are formed in a first zone of the first layer. A non-transparent layer is formed on top of the first layer. At least a portion of the non-transparent layer is removed from an area above the first zone of the first la...

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Bibliographische Detailangaben

Hauptverfasser:	Chauhan, Kripa Nidhan, Chinthamanipeta Sripadarao, Pavan Kumar, Li, Huaxiang, Bae, Sanggil, Yang, Dongyue, Chen, Rui, Ayala, Christian J, Srivastava, Ravi Prakash, Dai, Xintuo, Tran, Cung D, Morgenfeld, Bradley, Tang, Minghao, Bellah, Md Motasim
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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