Lithographic apparatus and device manufacturing method
A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or ot...
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| creator | Simon, Klaus Van Santen, Helmar Verspay, Jacobus Johannus Leonardus Hendricus Kolesnychenko, Aleksey Yurievich Lof, Joeri Hoogendam, Christiaan Alexander Streefkerk, Bob Donders, Sjoerd Nicolaas Lambertus Meijer, Hendricus Johannes Maria Straaijer, Alexander Bijlaart, Erik Theodorus Maria Derksen, Antonius Theodorus Anna Maria Ritsema, Roelof Aeilko Siebrand Sengers, Timotheus Franciscus Mertens, Jeroen Johannes Sophia Maria Butler, Hans Loopstra, Erik Roelof Mulkens, Johannes Catharinus Hubertus Van Schaik, Frank De Smit, Joannes Theodoor Jansen, Hans |
| description | A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US10503084B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US10503084B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US10503084B23</originalsourceid><addsrcrecordid>eNrjZDDzySzJyE8vSizIyExWSCwoSCxKLCktVkjMS1FISS3LTE5VyE3MK01LTC4pLcrMS1fITQWqT-FhYE1LzClO5YXS3AyKbq4hzh66qQX58anFBYnJqXmpJfGhwYYGpgbGBhYmTkbGxKgBANhRLiI</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Lithographic apparatus and device manufacturing method</title><source>esp@cenet</source><creator>Simon, Klaus ; Van Santen, Helmar ; Verspay, Jacobus Johannus Leonardus Hendricus ; Kolesnychenko, Aleksey Yurievich ; Lof, Joeri ; Hoogendam, Christiaan Alexander ; Streefkerk, Bob ; Donders, Sjoerd Nicolaas Lambertus ; Meijer, Hendricus Johannes Maria ; Straaijer, Alexander ; Bijlaart, Erik Theodorus Maria ; Derksen, Antonius Theodorus Anna Maria ; Ritsema, Roelof Aeilko Siebrand ; Sengers, Timotheus Franciscus ; Mertens, Jeroen Johannes Sophia Maria ; Butler, Hans ; Loopstra, Erik Roelof ; Mulkens, Johannes Catharinus Hubertus ; Van Schaik, Frank ; De Smit, Joannes Theodoor ; Jansen, Hans</creator><creatorcontrib>Simon, Klaus ; Van Santen, Helmar ; Verspay, Jacobus Johannus Leonardus Hendricus ; Kolesnychenko, Aleksey Yurievich ; Lof, Joeri ; Hoogendam, Christiaan Alexander ; Streefkerk, Bob ; Donders, Sjoerd Nicolaas Lambertus ; Meijer, Hendricus Johannes Maria ; Straaijer, Alexander ; Bijlaart, Erik Theodorus Maria ; Derksen, Antonius Theodorus Anna Maria ; Ritsema, Roelof Aeilko Siebrand ; Sengers, Timotheus Franciscus ; Mertens, Jeroen Johannes Sophia Maria ; Butler, Hans ; Loopstra, Erik Roelof ; Mulkens, Johannes Catharinus Hubertus ; Van Schaik, Frank ; De Smit, Joannes Theodoor ; Jansen, Hans</creatorcontrib><description>A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.</description><language>eng</language><subject>ACCESSORIES THEREFOR ; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES ; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20191210&DB=EPODOC&CC=US&NR=10503084B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76516</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20191210&DB=EPODOC&CC=US&NR=10503084B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Simon, Klaus</creatorcontrib><creatorcontrib>Van Santen, Helmar</creatorcontrib><creatorcontrib>Verspay, Jacobus Johannus Leonardus Hendricus</creatorcontrib><creatorcontrib>Kolesnychenko, Aleksey Yurievich</creatorcontrib><creatorcontrib>Lof, Joeri</creatorcontrib><creatorcontrib>Hoogendam, Christiaan Alexander</creatorcontrib><creatorcontrib>Streefkerk, Bob</creatorcontrib><creatorcontrib>Donders, Sjoerd Nicolaas Lambertus</creatorcontrib><creatorcontrib>Meijer, Hendricus Johannes Maria</creatorcontrib><creatorcontrib>Straaijer, Alexander</creatorcontrib><creatorcontrib>Bijlaart, Erik Theodorus Maria</creatorcontrib><creatorcontrib>Derksen, Antonius Theodorus Anna Maria</creatorcontrib><creatorcontrib>Ritsema, Roelof Aeilko Siebrand</creatorcontrib><creatorcontrib>Sengers, Timotheus Franciscus</creatorcontrib><creatorcontrib>Mertens, Jeroen Johannes Sophia Maria</creatorcontrib><creatorcontrib>Butler, Hans</creatorcontrib><creatorcontrib>Loopstra, Erik Roelof</creatorcontrib><creatorcontrib>Mulkens, Johannes Catharinus Hubertus</creatorcontrib><creatorcontrib>Van Schaik, Frank</creatorcontrib><creatorcontrib>De Smit, Joannes Theodoor</creatorcontrib><creatorcontrib>Jansen, Hans</creatorcontrib><title>Lithographic apparatus and device manufacturing method</title><description>A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.</description><subject>ACCESSORIES THEREFOR</subject><subject>APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES</subject><subject>APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDDzySzJyE8vSizIyExWSCwoSCxKLCktVkjMS1FISS3LTE5VyE3MK01LTC4pLcrMS1fITQWqT-FhYE1LzClO5YXS3AyKbq4hzh66qQX58anFBYnJqXmpJfGhwYYGpgbGBhYmTkbGxKgBANhRLiI</recordid><startdate>20191210</startdate><enddate>20191210</enddate><creator>Simon, Klaus</creator><creator>Van Santen, Helmar</creator><creator>Verspay, Jacobus Johannus Leonardus Hendricus</creator><creator>Kolesnychenko, Aleksey Yurievich</creator><creator>Lof, Joeri</creator><creator>Hoogendam, Christiaan Alexander</creator><creator>Streefkerk, Bob</creator><creator>Donders, Sjoerd Nicolaas Lambertus</creator><creator>Meijer, Hendricus Johannes Maria</creator><creator>Straaijer, Alexander</creator><creator>Bijlaart, Erik Theodorus Maria</creator><creator>Derksen, Antonius Theodorus Anna Maria</creator><creator>Ritsema, Roelof Aeilko Siebrand</creator><creator>Sengers, Timotheus Franciscus</creator><creator>Mertens, Jeroen Johannes Sophia Maria</creator><creator>Butler, Hans</creator><creator>Loopstra, Erik Roelof</creator><creator>Mulkens, Johannes Catharinus Hubertus</creator><creator>Van Schaik, Frank</creator><creator>De Smit, Joannes Theodoor</creator><creator>Jansen, Hans</creator><scope>EVB</scope></search><sort><creationdate>20191210</creationdate><title>Lithographic apparatus and device manufacturing method</title><author>Simon, Klaus ; Van Santen, Helmar ; Verspay, Jacobus Johannus Leonardus Hendricus ; Kolesnychenko, Aleksey Yurievich ; Lof, Joeri ; Hoogendam, Christiaan Alexander ; Streefkerk, Bob ; Donders, Sjoerd Nicolaas Lambertus ; Meijer, Hendricus Johannes Maria ; Straaijer, Alexander ; Bijlaart, Erik Theodorus Maria ; Derksen, Antonius Theodorus Anna Maria ; Ritsema, Roelof Aeilko Siebrand ; Sengers, Timotheus Franciscus ; Mertens, Jeroen Johannes Sophia Maria ; Butler, Hans ; Loopstra, Erik Roelof ; Mulkens, Johannes Catharinus Hubertus ; Van Schaik, Frank ; De Smit, Joannes Theodoor ; Jansen, Hans</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US10503084B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2019</creationdate><topic>ACCESSORIES THEREFOR</topic><topic>APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES</topic><topic>APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>Simon, Klaus</creatorcontrib><creatorcontrib>Van Santen, Helmar</creatorcontrib><creatorcontrib>Verspay, Jacobus Johannus Leonardus Hendricus</creatorcontrib><creatorcontrib>Kolesnychenko, Aleksey Yurievich</creatorcontrib><creatorcontrib>Lof, Joeri</creatorcontrib><creatorcontrib>Hoogendam, Christiaan Alexander</creatorcontrib><creatorcontrib>Streefkerk, Bob</creatorcontrib><creatorcontrib>Donders, Sjoerd Nicolaas Lambertus</creatorcontrib><creatorcontrib>Meijer, Hendricus Johannes Maria</creatorcontrib><creatorcontrib>Straaijer, Alexander</creatorcontrib><creatorcontrib>Bijlaart, Erik Theodorus Maria</creatorcontrib><creatorcontrib>Derksen, Antonius Theodorus Anna Maria</creatorcontrib><creatorcontrib>Ritsema, Roelof Aeilko Siebrand</creatorcontrib><creatorcontrib>Sengers, Timotheus Franciscus</creatorcontrib><creatorcontrib>Mertens, Jeroen Johannes Sophia Maria</creatorcontrib><creatorcontrib>Butler, Hans</creatorcontrib><creatorcontrib>Loopstra, Erik Roelof</creatorcontrib><creatorcontrib>Mulkens, Johannes Catharinus Hubertus</creatorcontrib><creatorcontrib>Van Schaik, Frank</creatorcontrib><creatorcontrib>De Smit, Joannes Theodoor</creatorcontrib><creatorcontrib>Jansen, Hans</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Simon, Klaus</au><au>Van Santen, Helmar</au><au>Verspay, Jacobus Johannus Leonardus Hendricus</au><au>Kolesnychenko, Aleksey Yurievich</au><au>Lof, Joeri</au><au>Hoogendam, Christiaan Alexander</au><au>Streefkerk, Bob</au><au>Donders, Sjoerd Nicolaas Lambertus</au><au>Meijer, Hendricus Johannes Maria</au><au>Straaijer, Alexander</au><au>Bijlaart, Erik Theodorus Maria</au><au>Derksen, Antonius Theodorus Anna Maria</au><au>Ritsema, Roelof Aeilko Siebrand</au><au>Sengers, Timotheus Franciscus</au><au>Mertens, Jeroen Johannes Sophia Maria</au><au>Butler, Hans</au><au>Loopstra, Erik Roelof</au><au>Mulkens, Johannes Catharinus Hubertus</au><au>Van Schaik, Frank</au><au>De Smit, Joannes Theodoor</au><au>Jansen, Hans</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Lithographic apparatus and device manufacturing method</title><date>2019-12-10</date><risdate>2019</risdate><abstract>A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Lithographic apparatus and device manufacturing method |
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