Methods and apparatus for determining the position of a target structure on a substrate, methods and apparatus for determining the position of a substrate
A target structure such as an alignment mark on a semiconductor substrate becomes obscured by an opaque layer so that it cannot be located by an alignment sensor. A position for the mark is determined using an edge position sensor and relative position information that defines the position of the ma...
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| creator | Bijnen, Franciscus Godefridus Casper Onvlee, Johannes Boshouwers, Augustinus Hubert Maria |
| description | A target structure such as an alignment mark on a semiconductor substrate becomes obscured by an opaque layer so that it cannot be located by an alignment sensor. A position for the mark is determined using an edge position sensor and relative position information that defines the position of the mark relative to one or more edge portions of the substrate is stored prior to formation of the opaque layer. A window can be opened in the opaque layer, based on the determined position. After revealing the target structure, the alignment sensor can, if desired, measure more accurately the position of the target structure, for use in controlling a further lithographic step. The edge position sensor may be a camera having an angle-selective behavior. The edge position sensor may be integrated within the alignment sensor hardware. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US10444647B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US10444647B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US10444647B23</originalsourceid><addsrcrecordid>eNqdjLsKwkAQRdNYiPoP117BxxJ7RbGxUuswJrPJgtlddmZ_xq81hViL1YF7LmdcvC6sXWgE5BtQjJRIs8CGhIaVU--88y20Y8QgTl3wCBYEpdSyQjTlWnNiDIIg-TEspLxA_2f4m5gWI0tP4dmHk2J-Ot4O5yXHULFEqtmzVvfremWMKc1uv9n-8nkDR2tTjw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Methods and apparatus for determining the position of a target structure on a substrate, methods and apparatus for determining the position of a substrate</title><source>esp@cenet</source><creator>Bijnen, Franciscus Godefridus Casper ; Onvlee, Johannes ; Boshouwers, Augustinus Hubert Maria</creator><creatorcontrib>Bijnen, Franciscus Godefridus Casper ; Onvlee, Johannes ; Boshouwers, Augustinus Hubert Maria</creatorcontrib><description>A target structure such as an alignment mark on a semiconductor substrate becomes obscured by an opaque layer so that it cannot be located by an alignment sensor. A position for the mark is determined using an edge position sensor and relative position information that defines the position of the mark relative to one or more edge portions of the substrate is stored prior to formation of the opaque layer. A window can be opened in the opaque layer, based on the determined position. After revealing the target structure, the alignment sensor can, if desired, measure more accurately the position of the target structure, for use in controlling a further lithographic step. The edge position sensor may be a camera having an angle-selective behavior. The edge position sensor may be integrated within the alignment sensor hardware.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20191015&DB=EPODOC&CC=US&NR=10444647B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20191015&DB=EPODOC&CC=US&NR=10444647B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Bijnen, Franciscus Godefridus Casper</creatorcontrib><creatorcontrib>Onvlee, Johannes</creatorcontrib><creatorcontrib>Boshouwers, Augustinus Hubert Maria</creatorcontrib><title>Methods and apparatus for determining the position of a target structure on a substrate, methods and apparatus for determining the position of a substrate</title><description>A target structure such as an alignment mark on a semiconductor substrate becomes obscured by an opaque layer so that it cannot be located by an alignment sensor. A position for the mark is determined using an edge position sensor and relative position information that defines the position of the mark relative to one or more edge portions of the substrate is stored prior to formation of the opaque layer. A window can be opened in the opaque layer, based on the determined position. After revealing the target structure, the alignment sensor can, if desired, measure more accurately the position of the target structure, for use in controlling a further lithographic step. The edge position sensor may be a camera having an angle-selective behavior. The edge position sensor may be integrated within the alignment sensor hardware.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqdjLsKwkAQRdNYiPoP117BxxJ7RbGxUuswJrPJgtlddmZ_xq81hViL1YF7LmdcvC6sXWgE5BtQjJRIs8CGhIaVU--88y20Y8QgTl3wCBYEpdSyQjTlWnNiDIIg-TEspLxA_2f4m5gWI0tP4dmHk2J-Ot4O5yXHULFEqtmzVvfremWMKc1uv9n-8nkDR2tTjw</recordid><startdate>20191015</startdate><enddate>20191015</enddate><creator>Bijnen, Franciscus Godefridus Casper</creator><creator>Onvlee, Johannes</creator><creator>Boshouwers, Augustinus Hubert Maria</creator><scope>EVB</scope></search><sort><creationdate>20191015</creationdate><title>Methods and apparatus for determining the position of a target structure on a substrate, methods and apparatus for determining the position of a substrate</title><author>Bijnen, Franciscus Godefridus Casper ; Onvlee, Johannes ; Boshouwers, Augustinus Hubert Maria</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US10444647B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2019</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>Bijnen, Franciscus Godefridus Casper</creatorcontrib><creatorcontrib>Onvlee, Johannes</creatorcontrib><creatorcontrib>Boshouwers, Augustinus Hubert Maria</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Bijnen, Franciscus Godefridus Casper</au><au>Onvlee, Johannes</au><au>Boshouwers, Augustinus Hubert Maria</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Methods and apparatus for determining the position of a target structure on a substrate, methods and apparatus for determining the position of a substrate</title><date>2019-10-15</date><risdate>2019</risdate><abstract>A target structure such as an alignment mark on a semiconductor substrate becomes obscured by an opaque layer so that it cannot be located by an alignment sensor. A position for the mark is determined using an edge position sensor and relative position information that defines the position of the mark relative to one or more edge portions of the substrate is stored prior to formation of the opaque layer. A window can be opened in the opaque layer, based on the determined position. After revealing the target structure, the alignment sensor can, if desired, measure more accurately the position of the target structure, for use in controlling a further lithographic step. The edge position sensor may be a camera having an angle-selective behavior. The edge position sensor may be integrated within the alignment sensor hardware.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | Methods and apparatus for determining the position of a target structure on a substrate, methods and apparatus for determining the position of a substrate |
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