Fluid handling structure and lithographic apparatus

An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards o...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Eummelen, Erik Henricus Egidius Catharina, Melman, Johannes Cornelis Paulus, Lempens, Han Henricus Aldegonda, Olieslagers, Ruud, Rops, Cornelius Maria, Yu, Miao, Polet, Theodorus Wilhelmus, Ulucan, Artunç, Spruytenburg, Patrick Johannes Wilhelmus, Gattobigio, Giovanni Luca
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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