Method of processing a substrate using an ion beam and apparatus for performing the same

In an example embodiment a method of processing a substrate includes forming a plasma in a plasma chamber and using charged grids to form an ion beam and to thereby accelerate ions from the plasma chamber to a processing chamber. An auxiliary heater, which may be a radiant heater, may be used to pre...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Shin, Kyoung-Sub, Nam, Seok-Woo, Lee, Yil-Hyung, Park, Jong-Soon, Kong, Yoo-Chul, Kim, Jong-Kyu
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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