Electrostatic chuck
An electrostatic chuck includes a dielectric layer and a conductive layer located inside the dielectric layer. The dielectric layer includes an upper surface and a plurality of protrusions protruding from the upper surface. Each of the protrusions includes a top portion that serves as an attraction...
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creator | Miyamoto, Kazuyoshi Shimizu, Kazunori |
description | An electrostatic chuck includes a dielectric layer and a conductive layer located inside the dielectric layer. The dielectric layer includes an upper surface and a plurality of protrusions protruding from the upper surface. Each of the protrusions includes a top portion that serves as an attraction surface on which a substrate is attracted. The dielectric layer includes a plurality of first dielectric portions and a second dielectric portion. The second dielectric portion surrounds each of the first dielectric portions in the upper surface of the dielectric layer. At least some of the first dielectric portions include the protrusions and are bonded to the conductive layer. Each of the first dielectric portions is formed from a material that differs from that of the second dielectric portion. |
format | Patent |
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Each of the protrusions includes a top portion that serves as an attraction surface on which a substrate is attracted. The dielectric layer includes a plurality of first dielectric portions and a second dielectric portion. The second dielectric portion surrounds each of the first dielectric portions in the upper surface of the dielectric layer. At least some of the first dielectric portions include the protrusions and are bonded to the conductive layer. Each of the first dielectric portions is formed from a material that differs from that of the second dielectric portion.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER ; CORONA DEVICES ; ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES ; GENERATION ; OVERVOLTAGE ARRESTERS USING SPARK GAPS ; SEMICONDUCTOR DEVICES ; SPARK GAPS ; SPARKING PLUGS</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190813&DB=EPODOC&CC=US&NR=10381253B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190813&DB=EPODOC&CC=US&NR=10381253B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Miyamoto, Kazuyoshi</creatorcontrib><creatorcontrib>Shimizu, Kazunori</creatorcontrib><title>Electrostatic chuck</title><description>An electrostatic chuck includes a dielectric layer and a conductive layer located inside the dielectric layer. The dielectric layer includes an upper surface and a plurality of protrusions protruding from the upper surface. Each of the protrusions includes a top portion that serves as an attraction surface on which a substrate is attracted. The dielectric layer includes a plurality of first dielectric portions and a second dielectric portion. The second dielectric portion surrounds each of the first dielectric portions in the upper surface of the dielectric layer. At least some of the first dielectric portions include the protrusions and are bonded to the conductive layer. Each of the first dielectric portions is formed from a material that differs from that of the second dielectric portion.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CONVERSION OR DISTRIBUTION OF ELECTRIC POWER</subject><subject>CORONA DEVICES</subject><subject>ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES</subject><subject>GENERATION</subject><subject>OVERVOLTAGE ARRESTERS USING SPARK GAPS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SPARK GAPS</subject><subject>SPARKING PLUGS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBB2zUlNLinKLy5JLMlMVkjOKE3O5mFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8aHBhgbGFoZGpsZORsbEqAEANMwgoA</recordid><startdate>20190813</startdate><enddate>20190813</enddate><creator>Miyamoto, Kazuyoshi</creator><creator>Shimizu, Kazunori</creator><scope>EVB</scope></search><sort><creationdate>20190813</creationdate><title>Electrostatic chuck</title><author>Miyamoto, Kazuyoshi ; Shimizu, Kazunori</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US10381253B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2019</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CONVERSION OR DISTRIBUTION OF ELECTRIC POWER</topic><topic>CORONA DEVICES</topic><topic>ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES</topic><topic>GENERATION</topic><topic>OVERVOLTAGE ARRESTERS USING SPARK GAPS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SPARK GAPS</topic><topic>SPARKING PLUGS</topic><toplevel>online_resources</toplevel><creatorcontrib>Miyamoto, Kazuyoshi</creatorcontrib><creatorcontrib>Shimizu, Kazunori</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Miyamoto, Kazuyoshi</au><au>Shimizu, Kazunori</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Electrostatic chuck</title><date>2019-08-13</date><risdate>2019</risdate><abstract>An electrostatic chuck includes a dielectric layer and a conductive layer located inside the dielectric layer. The dielectric layer includes an upper surface and a plurality of protrusions protruding from the upper surface. Each of the protrusions includes a top portion that serves as an attraction surface on which a substrate is attracted. The dielectric layer includes a plurality of first dielectric portions and a second dielectric portion. The second dielectric portion surrounds each of the first dielectric portions in the upper surface of the dielectric layer. At least some of the first dielectric portions include the protrusions and are bonded to the conductive layer. Each of the first dielectric portions is formed from a material that differs from that of the second dielectric portion.</abstract><oa>free_for_read</oa></addata></record> |
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language | eng |
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subjects | BASIC ELECTRIC ELEMENTS CONVERSION OR DISTRIBUTION OF ELECTRIC POWER CORONA DEVICES ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES GENERATION OVERVOLTAGE ARRESTERS USING SPARK GAPS SEMICONDUCTOR DEVICES SPARK GAPS SPARKING PLUGS |
title | Electrostatic chuck |
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