Method of fabricating semiconductor devices

A method of fabricating a semiconductor device includes patterning a substrate to form an active fin, forming a sacrificial gate pattern crossing over the active fin on the substrate, removing the sacrificial gate pattern to form a gap region exposing the active fin, and forming a separation region...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Ha, Seungseok, Ha, Daewon, Hong, Byoung Hak
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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